CaltechAUTHORS
  A Caltech Library Service

Back-action-evading measurements of nanomechanical motion

Hertzberg, J. B. and Rocheleau, T. and Ndukum, T. and Savva, M. and Clerk, A. A. and Schwab, K. C. (2010) Back-action-evading measurements of nanomechanical motion. Nature Physics, 6 (3). pp. 213-217. ISSN 1745-2473. https://resolver.caltech.edu/CaltechAUTHORS:20100408-094321850

[img] PDF - Submitted Version
See Usage Policy.

289Kb
[img]
Preview
PDF - Supplemental Material
See Usage Policy.

1086Kb

Use this Persistent URL to link to this item: https://resolver.caltech.edu/CaltechAUTHORS:20100408-094321850

Abstract

When carrying out ultrasensitive continuous measurements of position, one must ultimately confront the fundamental effects of detection back-action. Back-action forces set a lower bound on the uncertainty in the measured position, the ‘standard quantum limit’ (SQL). Recent measurements of nano- and micromechanical resonators are rapidly approaching this limit. Making measurements with sensitivities surpassing the SQL will require a new kind of approach: back-action-evading (BAE), quantum non-demolition measurement techniques. Here we realize a BAE measurement based on the parametric coupling between a nanomechanical and a microwave resonator. We demonstrate for the first time BAE detection of a single quadrature of motion with sensitivity four times the quantum zero-point motion of the mechanical resonator. We identify a limiting parametric instability inherent in BAE measurement, and describe how to improve the technique to surpass the SQL and permit the formation of squeezed states of motion.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1038/nphys1479DOIArticle
http://www.nature.com/nphys/journal/v6/n3/full/nphys1479.htmlPublisherArticle
https://arxiv.org/abs/0906.0967arXivDiscussion Paper
ORCID:
AuthorORCID
Clerk, A. A.0000-0001-7297-9068
Schwab, K. C.0000-0001-8216-4815
Additional Information:© 2010 Macmillan Publishers Limited. Received 24 April 2009; accepted 10 November 2009; published online 6 December 2009. We would like to acknowledge helpful conversations with G. Milburn, M. Aspelmeyer, B. Plourde, M. Blencowe and R. Onofrio, and the assistance of P. Hauck, M. Corbett, S. Rosenthal and C. Macklin. The work has been supported by Cornell University and grants from FQXi and the National Science Foundation. A.A.C. wishes to thank the Canadian Institute for Advanced Research. Device fabrication was carried out at the NSF-sponsored Cornell Nanoscale Facility.
Funders:
Funding AgencyGrant Number
Cornell UniversityUNSPECIFIED
Foundational Questions Institute (FQXI)UNSPECIFIED
NSFUNSPECIFIED
Canadian Institute for Advanced Research (CIFAR)UNSPECIFIED
Subject Keywords:Electronics, photonics and device physics Nanotechnology
Issue or Number:3
Record Number:CaltechAUTHORS:20100408-094321850
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20100408-094321850
Official Citation:Hertzberg, J. B., T. Rocheleau, et al. (2010). "Back-action-evading measurements of nanomechanical motion." Nat Phys 6(3): 213-217.
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:17893
Collection:CaltechAUTHORS
Deposited By: Ruth Sustaita
Deposited On:14 May 2010 18:03
Last Modified:09 Mar 2020 13:18

Repository Staff Only: item control page