CaltechAUTHORS
  A Caltech Library Service

Pure-silica LTA, CHA, STT, ITW, and -SVR thin films and powders for low-k applications

Hunt, Heather K. and Lew, Christopher M. and Sun, Minwei and Yan, Yushan and Davis, Mark E. (2010) Pure-silica LTA, CHA, STT, ITW, and -SVR thin films and powders for low-k applications. Microporous and Mesoporous Materials, 130 (1-3). pp. 49-55. ISSN 1387-1811. https://resolver.caltech.edu/CaltechAUTHORS:20100412-094056315

Full text is not posted in this repository. Consult Related URLs below.

Use this Persistent URL to link to this item: https://resolver.caltech.edu/CaltechAUTHORS:20100412-094056315

Abstract

The fluoride-mediated synthesis of pure-silica zeolite thin films with the STT and SSZ-74 (-SVR) topologies on surface-modified (1 0 0) Si wafers is reported. The films are prepared using the vapor phase transport of the fluoride mineralizing agent, a method used previously to synthesize thin films of the pure-silica zeolite topologies LTA, CHA, and ITW. The STT and -SVR films are polycrystalline, intergrown, continuous, and well-adhered to their substrates. The films are characterized by a combination of techniques, including X-ray diffraction and field emission scanning electron microscopy. The LTA, STT, -SVR, CHA, and ITW powders and films are investigated for low dielectric constant (low-k) material applications. The films are evaluated via parallel-plate capacitance measurements using an LCR meter; however, consistent k-values are not obtained due to variable film thicknesses and imperfectly parallel metal–insulator–metal structures. This variability is a limitation of the mechanical polishing equipment available, rather than the films themselves. Using a Time-Domain Reflectometer, combined with a transmission line, at various frequencies, the k-values of the powdered zeolites are determined. All the zeolites investigated, except STT, give k-values lower than those predicted from their structures using the Bruggeman effective medium model that has been commonly employed and found able to predict dielectric constants for amorphous silicas.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1016/j.micromeso.2009.10.011 DOIArticle
ORCID:
AuthorORCID
Davis, Mark E.0000-0001-8294-1477
Additional Information:© 2009 Elsevier Inc. Received 31 August 2009; accepted 15 October 2009. Available online 21 October 2009. The authors thank the National Science Foundation (CTS-0404376), as well as the National Science Foundation Graduate Research Fellowship Program, for financial support. The authors also thank Dr. Wolfgang Maichen at Teradyne, Inc. for his help and advice regarding the zeolite powder dielectric properties measurements. Lastly, the authors thank Allen Burton at Chevron Energy Technology Co. for providing materials and assistance with the SSZ-74 syntheses.
Funders:
Funding AgencyGrant Number
NSFCTS-0404376
NSF Graduate Research FellowshipUNSPECIFIED
Subject Keywords:Low-k; STT; -SVR; Thin films; Zeolite
Issue or Number:1-3
Record Number:CaltechAUTHORS:20100412-094056315
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20100412-094056315
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:17932
Collection:CaltechAUTHORS
Deposited By: Ruth Sustaita
Deposited On:12 Apr 2010 17:15
Last Modified:09 Mar 2020 13:18

Repository Staff Only: item control page