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Pure-silica LTA, CHA, STT, ITW, and -SVR thin films and powders for low-k applications

Hunt, Heather K. and Lew, Christopher M. and Sun, Minwei and Yan, Yushan and Davis, Mark E. (2010) Pure-silica LTA, CHA, STT, ITW, and -SVR thin films and powders for low-k applications. Microporous and Mesoporous Materials, 130 (1-3). pp. 49-55. ISSN 1387-1811.

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The fluoride-mediated synthesis of pure-silica zeolite thin films with the STT and SSZ-74 (-SVR) topologies on surface-modified (1 0 0) Si wafers is reported. The films are prepared using the vapor phase transport of the fluoride mineralizing agent, a method used previously to synthesize thin films of the pure-silica zeolite topologies LTA, CHA, and ITW. The STT and -SVR films are polycrystalline, intergrown, continuous, and well-adhered to their substrates. The films are characterized by a combination of techniques, including X-ray diffraction and field emission scanning electron microscopy. The LTA, STT, -SVR, CHA, and ITW powders and films are investigated for low dielectric constant (low-k) material applications. The films are evaluated via parallel-plate capacitance measurements using an LCR meter; however, consistent k-values are not obtained due to variable film thicknesses and imperfectly parallel metal–insulator–metal structures. This variability is a limitation of the mechanical polishing equipment available, rather than the films themselves. Using a Time-Domain Reflectometer, combined with a transmission line, at various frequencies, the k-values of the powdered zeolites are determined. All the zeolites investigated, except STT, give k-values lower than those predicted from their structures using the Bruggeman effective medium model that has been commonly employed and found able to predict dielectric constants for amorphous silicas.

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URLURL TypeDescription DOIArticle
Davis, Mark E.0000-0001-8294-1477
Additional Information:© 2009 Elsevier Inc. Received 31 August 2009; accepted 15 October 2009. Available online 21 October 2009. The authors thank the National Science Foundation (CTS-0404376), as well as the National Science Foundation Graduate Research Fellowship Program, for financial support. The authors also thank Dr. Wolfgang Maichen at Teradyne, Inc. for his help and advice regarding the zeolite powder dielectric properties measurements. Lastly, the authors thank Allen Burton at Chevron Energy Technology Co. for providing materials and assistance with the SSZ-74 syntheses.
Funding AgencyGrant Number
NSF Graduate Research FellowshipUNSPECIFIED
Subject Keywords:Low-k; STT; -SVR; Thin films; Zeolite
Issue or Number:1-3
Record Number:CaltechAUTHORS:20100412-094056315
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Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:17932
Deposited By: Ruth Sustaita
Deposited On:12 Apr 2010 17:15
Last Modified:09 Mar 2020 13:18

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