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Monolithic High-Aspect-Ratio Embedded Parylene Channel Technology: Fabrication, Integration, and Applications

Chen, Po-Jui and Tai, Yu-Chong (2006) Monolithic High-Aspect-Ratio Embedded Parylene Channel Technology: Fabrication, Integration, and Applications. In: 2006 1st IEEE International Conference on Nano/Micro Engineered and Molecular Systems. IEEE , Piscataway, N.J., pp. 1284-1287. ISBN 1-4244-0139-9. https://resolver.caltech.edu/CaltechAUTHORS:20110215-134334659

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Abstract

This paper presents a novel channel fabrication technology of monolithic bulk-micromachined embedded channels. Based upon implementing two-step complementary dry etching technique and conformal parylene C layer deposition, high-aspect-ratio (internal channel height/internal channel width, greater than 20) polymer channels with uniform quasirectangular sidewalls have been successfully fabricated in one silicon wafer. The fabrication is completely compatible with further lithographic CMOS/MEMS process, which enables its total integration with on-chip micro sensors/actuators/structures for lab-on-a-chip applications. An exemplary process has been successfully demonstrated to verify the possibility of combining bulk micromachining and surface micromachining. This proposed formation of channels can be extensively used as beam elements in micromechanical devices or microcolumns for high-performance/high-throughput chip-based separation analysis. A spiral parylene column longer than 1.1 m embedded in a 3.3 mm x 3.3 mm chip has been presented as a prospective element in micro gas-chromatography (µGC).


Item Type:Book Section
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1109/NEMS.2006.334716 DOIArticle
http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=4135180PublisherArticle
ORCID:
AuthorORCID
Tai, Yu-Chong0000-0001-8529-106X
Additional Information:© 2006 IEEE. Issue Date: 18-21 Jan. 2006, Date of Current Version: 19 March 2007. This work was supported in part by the Engineering Research Centers Program of the National Science Foundation under NSF Award Number EEC-0310723. The authors would like to especially thank Mr. Trevor Roper for his fabrication assistance.
Funders:
Funding AgencyGrant Number
NSFEEC-0310723
Subject Keywords:embedded channel; high-aspect-ratio; monolithic; parylene
Record Number:CaltechAUTHORS:20110215-134334659
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20110215-134334659
Official Citation:Po-Jui Chen; Yu-Chong Tai; , "Monolithic High-Aspect-Ratio Embedded Parylene Channel Technology: Fabrication, Integration, and Applications," Nano/Micro Engineered and Molecular Systems, 2006. NEMS '06. 1st IEEE International Conference on , vol., no., pp.1284-1287, 18-21 Jan. 2006 doi: 10.1109/NEMS.2006.334716 URL: http://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=4135180&isnumber=4084516
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:22223
Collection:CaltechAUTHORS
Deposited By: Benjamin Perez
Deposited On:15 Feb 2011 22:11
Last Modified:03 Oct 2019 02:36

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