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In situ measurements of stress with temperature in thin film Pb_xBa_(1-x)TiO_3

Boyd, D. A. and El-Naggar, M. Y. and Goodwin, D. G. (2006) In situ measurements of stress with temperature in thin film Pb_xBa_(1-x)TiO_3. Integrated Ferroelectrics, 83 (1). pp. 155-164. ISSN 1058-4587. doi:10.1080/10584580600950822. https://resolver.caltech.edu/CaltechAUTHORS:20110217-105906732

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Abstract

In situ curvature measurements were used to monitor the macroscopic film stress with temperature in well-oriented thin films of Pb_xBa_(1-x)TiO_3 (x = 0.2, 0.5, 1.0) on single crystal MgO (001). Successive measurements were made between room and the growth temperature, 650 °C. The films were found to be in compression at room temperature. The compressive stresses in the films continually decreased at nearly constant rates with increasing temperature, and near the Curie temperature for each composition Tc_(x) these rates increased. Energy minimization calculations were used to predict the changes in the domain volume fractions and the film stresses with temperature. We find qualitative agreement between the predicted and measured behavior of the domain volume fractions. However, the stress in the films is not relaxed below Tc_(x) as expected. We discuss the effects that may inhibit this relaxation, namely film thickness, growth effects, and the presence of grain boundaries


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1080/10584580600950822DOIUNSPECIFIED
http://www.informaworld.com/smpp/content~db=all~content=a759130297~frm=titlelinkPublisherUNSPECIFIED
Additional Information:© 2006 Taylor & Francis Group. Received May 1, 2006; in final form May 27, 2006. This work has been supported by ARO MURI grant number DAADI9-01-1-0517.
Funders:
Funding AgencyGrant Number
Army Research Office (ARO)/Multi-University Research Initiative (MURI)DAADI9-01-1-0517
Subject Keywords:Ferroelectrics; polydomain structures; thin films; film stress; stress relaxation; CGS; Coherent Gradient Sensing
Issue or Number:1
DOI:10.1080/10584580600950822
Record Number:CaltechAUTHORS:20110217-105906732
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20110217-105906732
Official Citation:IN SITU MEASUREMENTS OF STRESS WITH TEMPERATURE IN THIN FILM PbxBa1 - xTiO3 D. A. Boyd; M. Y. El-Naggar; D. G. Goodwin Pages 155 – 164
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:22351
Collection:CaltechAUTHORS
Deposited By: Ruth Sustaita
Deposited On:17 Feb 2011 19:21
Last Modified:09 Nov 2021 16:04

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