CaltechAUTHORS
  A Caltech Library Service

Batch Fabrication of High-Performance Planar Patch-Clamp Devices in Quartz

Nagarah, John M. and Paek, Eunsu and Luo, Yi and Wang, Pin and Hwang, Gyeong S. and Heath, James R. (2010) Batch Fabrication of High-Performance Planar Patch-Clamp Devices in Quartz. Advanced Materials, 22 (41). pp. 4622-4627. ISSN 0935-9648. http://resolver.caltech.edu/CaltechAUTHORS:20110310-100121704

[img]
Preview
PDF - Supplemental Material
See Usage Policy.

1479Kb

Use this Persistent URL to link to this item: http://resolver.caltech.edu/CaltechAUTHORS:20110310-100121704

Abstract

The success of the patch-clamp technique has driven an effort to create wafer-based patch-clamp platforms. We develop a lithographic/electrochemical processing scheme that generates ultrasmooth, high aspect ratio pores in quartz. These devices achieve gigaohm seals in nearly 80% of trials, with the majority exhibiting seal resistances from 20-80 GΩ, competing with pipette-based patch-clamp measurements.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1002/adma.201001793DOIArticle
http://onlinelibrary.wiley.com/doi/10.1002/adma.201001793/abstractPublisherArticle
ORCID:
AuthorORCID
Heath, James R.0000-0001-5356-4385
Additional Information:© 2010 Wiley. Received: May 14, 2010. Published online: September 9, 2010. This work was funded by the National Cancer Institute grant no. 5U54 CA119347 (J.R.H., P.I.) and by the Institute for Collaborative Biotechnologies through grant DAAD19-03-D-0004 from the US Army Research Office. We thank Rigo Pantoja, Kate Klemic, Jan Behrends, and Fred Sachs for very useful advice and Habib Ahmad for contributions in creating figures in this manuscript. We also thank the UCLA Nanoelectronics Research Facility staff, especially Tom Lee and Joe Zendejas, for their support in device fabrication.
Funders:
Funding AgencyGrant Number
National Cancer Institute5U54 CA119347
Army Research Office (ARO)DAAD19-03-D-0004
Subject Keywords:planar patch-clamp; gigaohm seals; metal masks; reactive ion etching; high aspect ratio pore
Record Number:CaltechAUTHORS:20110310-100121704
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20110310-100121704
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:22808
Collection:CaltechAUTHORS
Deposited By: Ruth Sustaita
Deposited On:11 Mar 2011 16:36
Last Modified:25 Apr 2017 04:55

Repository Staff Only: item control page