Richardson, Christine E. and Mason, M. S. and Atwater, Harry A. (2006) Hot-wire CVD-grown epitaxial Si films on Si (100) substrates and a model of epitaxial breakdown. Thin Solid Films, 501 (1-2). pp. 332-334. ISSN 0040-6090. doi:10.1016/j.tsf.2005.07.213. https://resolver.caltech.edu/CaltechAUTHORS:20110427-141120361
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Abstract
We have previously reported on the low-temperature (T = 300–475 °C) epitaxial growth of thin silicon films by hot-wire chemical vapor deposition on Si (100). We derived a phase diagram for Si epitaxy on Si (100). With dilute SiH4, epitaxial growth is seen until 50 nm thickness, while twinned epitaxial growth is seen even at 1 μm thickness. Computer simulation of HWCVD growth suggests that oxygen incorporation is responsible for epitaxial breakdown. The model predicts that the silicon to oxygen ratio decreases with temperature and dilution ratio during the growth of the first monolayer of silicon.
| Item Type: | Article | |||||||||
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| Additional Information: | © 2005 Elsevier B.V. Available online 19 August 2005. | |||||||||
| Subject Keywords: | low-temperature epitaxial growth; hot-wire vapor deposition; polycrystalline thin film Si | |||||||||
| Issue or Number: | 1-2 | |||||||||
| DOI: | 10.1016/j.tsf.2005.07.213 | |||||||||
| Record Number: | CaltechAUTHORS:20110427-141120361 | |||||||||
| Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:20110427-141120361 | |||||||||
| Official Citation: | Christine E. Richardson, M.S. Mason, Harry A. Atwater, Hot-wire CVD-grown epitaxial Si films on Si (100) substrates and a model of epitaxial breakdown, Thin Solid Films, Volume 501, Issues 1-2, Proceedings of the Third International Conference on Hot-Wire CVD (Cat-CVD) Process, 20 April 2006, Pages 332-334, ISSN 0040-6090, DOI: 10.1016/j.tsf.2005.07.213. (http://www.sciencedirect.com/science/article/B6TW0-4GX64MH-F/2/61caf0836ff96b5fb7068b13144ee525) | |||||||||
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | |||||||||
| ID Code: | 23482 | |||||||||
| Collection: | CaltechAUTHORS | |||||||||
| Deposited By: | Tony Diaz | |||||||||
| Deposited On: | 28 Apr 2011 20:55 | |||||||||
| Last Modified: | 09 Nov 2021 16:15 |
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