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Phase-Multiplied Photoelastic and Series Interferometer Arrangement for Full-Field Stress Measurement

Xia, S. and Mello, M. (2011) Phase-Multiplied Photoelastic and Series Interferometer Arrangement for Full-Field Stress Measurement. Experimental Mechanics, 51 (4). pp. 653-666. ISSN 0014-4851. http://resolver.caltech.edu/CaltechAUTHORS:20110531-100017444

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Abstract

A compact, phase-multiplied, circular polariscope and series interferometer arrangement is developed for high-resolution, full-field stress measurement in single crystals with weak piezo-optical coefficients. We present a general stress-optic law, derived from anisotropic piezooptical constitutive relations, which provides the theoretical framework for obtaining stress field components from measured optical isoclinic, isochromatic and isopachic phase maps. A new phase image processing technique is also developed, which combines data obtained from different interference configurations for the successful removal of low-modulation zones within isoclinic and isopachic phase maps. The validity and accuracy of the proposed interferometer arrangement and stress measurement methodology are demonstrated through a compression test of a c-cut single crystal sapphire plate loaded by a cylindrical indenter.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1007/s11340-010-9448-x DOIUNSPECIFIED
http://www.springerlink.com/content/q7077g0w761x545k/PublisherUNSPECIFIED
Additional Information:© 2010 Society for Experimental Mechanics. Received: 26 July 2010; Accepted: 22 November 2010; Published online: 23 December 2010. Xia SM gratefully acknowledges the support of the National Science Foundation (DMR # 0520565) through the Center for Science and Engineering of Materials (CSEM) at the California Institute of Technology. The authors also thank Prof. Guruswami Ravichandran and Prof. Kaushik Bhattacharya at the California Institute of Technology for extremely helpful and insightful discussions.
Funders:
Funding AgencyGrant Number
NSF0520565
Subject Keywords:Photoelasticity; Series interferometer; Single crystals; Anisotropy; Stress measurement
Record Number:CaltechAUTHORS:20110531-100017444
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20110531-100017444
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:23831
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:20 Jun 2011 16:00
Last Modified:23 Aug 2016 10:01

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