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Ultraviolet antireflection coatings for use in silicon detector design

Hamden, Erika T. and Greer, Frank and Hoenk, Michael E. and Blacksberg, Jordana and Dickie, Matthew R. and Nikzad, Shouleh and Martin, D. Christopher and Schiminovich, David (2011) Ultraviolet antireflection coatings for use in silicon detector design. Applied Optics, 50 (21). pp. 4180-4188. ISSN 0003-6935. http://resolver.caltech.edu/CaltechAUTHORS:20110808-091608589

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Abstract

We report on the development of coatings for a charged-coupled device (CCD) detector optimized for use in a fixed dispersion UV spectrograph. Because of the rapidly changing index of refraction of Si, single layer broadband antireflection (AR) coatings are not suitable to increase quantum efficiency at all wavelengths of interest. Instead, we describe a creative solution that provides excellent performance over UV wavelengths. We describe progress in the development of a coated CCD detector with theoretical quantum efficiencies (QEs) of greater than 60% at wavelengths from 120 to 300 nm. This high efficiency may be reached by coating a backside-illuminated, thinned, delta-doped CCD with a series of thin film AR coatings. The materials tested include MgF_2 (optimized for highest performance from 120–150 nm), SiO_2 (150–180 nm), Al_2O_3 (180–240 nm), MgO (200–250 nm), and HfO_2 (240–300 nm). A variety of deposition techniques were tested and a selection of coatings that minimized reflectance on a Si test wafer were applied to functional devices. We also discuss future uses and improvements, including graded and multilayer coatings.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1364/AO.50.004180DOIArticle
http://www.opticsinfobase.org/abstract.cfm?URI=ao-50-21-4180PublisherArticle
Additional Information:© 2011 Optical Society of America. Received 23 February 2011; revised 25 May 2011; accepted 27 May 2011; posted 31 May 2011 (Doc. ID 142383); published 19 July 2011. The research described here was funded in part by a National Aeronautics and Space Administration (NASA) Space Grant. The research was carried out in part at the Jet Propulsion Laboratory, California Institute of Technology, under a contract with NASA, and was supported in part by internal funding from Columbia University. The authors wish to thank Blake Jacquot, Todd Jones, and Patrick Morrissey for their help and advice in the writing of this paper.
Group:Space Astrophysics Laboratory
Funders:
Funding AgencyGrant Number
NASA/JPL/CaltechUNSPECIFIED
Columbia University UNSPECIFIED
Classification Code:OCIS codes: 120.0120, 310.1210
Record Number:CaltechAUTHORS:20110808-091608589
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20110808-091608589
Official Citation:Erika T. Hamden, Frank Greer, Michael E. Hoenk, Jordana Blacksberg, Matthew R. Dickie, Shouleh Nikzad, D. Christopher Martin, and David Schiminovich, "Ultraviolet antireflection coatings for use in silicon detector design," Appl. Opt. 50, 4180-4188 (2011) http://www.opticsinfobase.org/abstract.cfm?URI=ao-50-21-4180
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:24722
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:26 Oct 2011 18:54
Last Modified:28 Aug 2016 20:29

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