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Band offsets in Si/Si1–x–yGexCy heterojunctions measured by admittance spectroscopy

Stein, B. L. and Yu, E. T. and Croke, E. T. and Hunter, A. T. and Laursen, T. and Bair, A. E. and Mayer, J. W. and Ahn, C. C. (1997) Band offsets in Si/Si1–x–yGexCy heterojunctions measured by admittance spectroscopy. Applied Physics Letters, 70 (25). pp. 3413-3415. ISSN 0003-6951. doi:10.1063/1.119188. https://resolver.caltech.edu/CaltechAUTHORS:STEapl97

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Abstract

We have used admittance spectroscopy to measure conduction-band and valence-band offsets in Si/Si1–xGex and Si/Si1–x–yGexCy heterostructures grown by solid-source molecular-beam epitaxy. Valence-band offsets measured for Si/Si1–xGex heterojunctions were in excellent agreement with previously reported values. Incorporation of C into Si1–x–yGexCy lowers the valence- and conduction-band-edge energies compared to those in Si1–xGex with the same Ge concentration. Comparison of our measured band offsets with previously reported measurements of energy band gaps in Si1–x–yGexCy and Si1–yCy alloy layers indicate that the band alignment is Type I for the compositions we have studied and that our measured band offsets are in quantitative agreement with these previously reported results.


Item Type:Article
Related URLs:
URLURL TypeDescription
https://doi.org/10.1063/1.119188DOIUNSPECIFIED
Additional Information:©1997 American Institute of Physics. (Received 19 December 1996; accepted 18 April 1997) The authors would like to acknowledge support from DARPA MDA972-95-3-0047 for work at UCSD, HRL, and ASU, and from ONR Grant No. N00014-95-1-0996 for work at UCSD. B.L.S. and E.T.Y. would also like to thank S. S. Lau for part of the equipment used in this work.
Subject Keywords:silicon; elemental semiconductors; Ge-Si alloys; silicon compounds; germanium compounds; semiconductor materials; wide band gap semiconductors; interface states; conduction bands; valence bands; energy gap; electric admittance; semiconductor heterojunctions
Issue or Number:25
DOI:10.1063/1.119188
Record Number:CaltechAUTHORS:STEapl97
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:STEapl97
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:2490
Collection:CaltechAUTHORS
Deposited By: Archive Administrator
Deposited On:05 Apr 2006
Last Modified:08 Nov 2021 19:48

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