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Chemically etched ultrahigh-Q wedge-resonator on a silicon chip

Lee, Hansuek and Chen, Tong and Li, Jiang and Yang, Ki Youl and Jeon, Seokmin and Painter, Oskar and Vahala, Kerry J. (2012) Chemically etched ultrahigh-Q wedge-resonator on a silicon chip. Nature Photonics, 6 (6). pp. 369-373. ISSN 1749-4885. doi:10.1038/NPHOTON.2012.109.

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Ultrahigh-Q optical resonators are being studied across a wide range of fields, including quantum information, nonlinear optics, cavity optomechanics and telecommunications. Here, we demonstrate a new resonator with a record Q-factor of 875 million for on-chip devices. The fabrication of our device avoids the requirement for a specialized processing step, which in microtoroid resonators8 has made it difficult to control their size and achieve millimetre- and centimetre-scale diameters. Attaining these sizes is important in applications such as microcombs and potentially also in rotation sensing. As an application of size control, stimulated Brillouin lasers incorporating our device are demonstrated. The resonators not only set a new benchmark for the Q-factor on a chip, but also provide, for the first time, full compatibility of this important device class with conventional semiconductor processing. This feature will greatly expand the range of possible ‘system on a chip’ functions enabled by ultrahigh-Q devices.

Item Type:Article
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URLURL TypeDescription DOIArticle ReadCube access Paper
Lee, Hansuek0000-0002-0748-7662
Yang, Ki Youl0000-0002-0587-3201
Jeon, Seokmin0000-0002-1230-906X
Painter, Oskar0000-0002-1581-9209
Vahala, Kerry J.0000-0003-1783-1380
Alternate Title:Ultra-high-Q wedge-resonator on a silicon chip
Additional Information:© 2012 Nature Publishing Group, a division of Macmillan Publishers Limited. Received 30 November 2011; Accepted 13 April 2012; Published online 20 May 2012. The authors acknowledge support from the Defense Advanced Research Projects Agency under the iPhoD and Orchid programmes and also the Kavli Nanoscience Institute at Caltech. H.L. acknowledges support from the Center for the Physics of Information, and S.J. thanks the Kwanjeong Educational Foundation. Author contributions: All authors made important contributions. H.L., T.C. and J.L. performed measurements and modelling, and contributed equally to the work. H.L. performed microfabrication of devices with assistance from T.C. and K.Y. AFM measurements were performed by H.L. and S.J. The experiments were conceived, designed and planned by H.L., T.C., J.L., O.P. and K.J.V. All authors helped to write the manuscript. The authors declare no competing financial interests.
Group:Kavli Nanoscience Institute
Funding AgencyGrant Number
Defense Advanced Research Projects Agency (DARPA)UNSPECIFIED
Kavli Nanoscience InstituteUNSPECIFIED
Center for the Physics of Information, CaltechUNSPECIFIED
Kwanjeong Educational FoundationUNSPECIFIED
Issue or Number:6
Record Number:CaltechAUTHORS:20120103-110617539
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Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:28611
Deposited By: Tony Diaz
Deposited On:13 Apr 2012 18:53
Last Modified:09 Nov 2021 16:59

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