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Chemically assisted ion beam etching of optical microresonators

Scherer, A. and Cheng, C. C. and Painter, O. and Lee, R. and Yariv, A. and Jewel, J. I. and Fainman, Y. (1997) Chemically assisted ion beam etching of optical microresonators. In: 1997 IEEE Lasers and Electro-Optics Society Annual Meeting (LEOS '97). IEEE , Piscataway, NJ, p. 98. ISBN 0-7803-3895-2.

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1-D, 2-D, 3-D microstructures with lateral dimensions at the scale of the wavelength of light can be used to generate high finesse microresonators. These have been fabricated in the AIMS system by combining MBE growth with micro-fabrication. Here we show the applications of anisotropicion beam etching and high resolution lithography in the fabrication of high-finesse micro-resonators and discuss their performance as lowthreshold microlasers, fast optical switches, photonic bandgap mirrors and polarizing beam-splitters.

Item Type:Book Section
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Painter, O.0000-0002-1581-9209
Additional Information:© 1997 IEEE. Issue Date: 10-13 Nov 1997; Date of Current Version: 06 August 2002.
Record Number:CaltechAUTHORS:20120119-094550521
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Official Citation:Scherer, A.; Cheng, C.C.; Painter, O.; Lee, R.; Yariv, A.; Jewel, J.I.; Fainman, Y.; , "Chemically assisted ion beam etching of optical microresonators," Lasers and Electro-Optics Society Annual Meeting, 1997. LEOS '97 10th Annual Meeting. Conference Proceedings., IEEE , vol.2, no., pp.98 vol.2, 10-13 Nov 1997 doi: 10.1109/LEOS.1997.645277
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:28854
Deposited On:19 Jan 2012 21:01
Last Modified:09 Nov 2021 17:01

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