Gehl, Michael and Gibson, Ricky and Hendrickson, Joshua and Homyk, Andrew and Säynätjoki, Antti and Alaasarela, Tapani and Karvonen, Lasse and Tervonen, Ari and Honkanen, Seppo and Zandbergen, Sander and Richards, Benjamin C. and Olitzky, J. D. and Scherer, Axel and Khitrova, Galina and Gibbs, Hyatt M. and Kim, Ju-Young and Lee, Yong-Hee (2012) Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities. Journal of the Optical Society of America B, 29 (2). A55-A59. ISSN 0740-3224. doi:10.1364/JOSAB.29.000A55. https://resolver.caltech.edu/CaltechAUTHORS:20120312-110035679
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Abstract
In this work we study the effect of thin-film deposition on the quality factor (Q) of silicon nanobeam cavities. We observe an average increase in the Q of 38±31% in one sample and investigate the dependence of this increase on the initial nanobeam hole sizes. We note that this process can be used to modify cavities that have larger than optimal hole sizes following fabrication. Additionally, the technique allows the tuning of the cavity mode wavelength and the incorporation of new materials, without significantly degrading Q.
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| Additional Information: | © 2012 Optical Society of America. Received October 4, 2011; revised December 12, 2011; accepted December 12, 2011; posted December 12, 2011 (Doc. ID 155915); published January 25, 2012. M. Gehl acknowledges support by the Department of Defense (DoD) through the National Defense Science & Engineering Graduate Fellowship (NDSEG) program. S. Zandbergen acknowledges partial support from Arizona Technology & Research Initiative Funding (TRIF). J. Hendrickson acknowledges support from the Air Force Office of Scientific Research (AFOSR)—LRIR 10RY04COR (Gernot Pomrenke, program manager). A. Homyk appreciates the generous support of the ARCS Foundation. A. Säynätjoki was supported by Academy of Finland grant 134087 and a travel grant by the Finnish Foundation for Technology Promotion. The Caltech and UofA groups thank NSF ERC CIAN (EEC-0812072) for support. The U of A group acknowledges support from the AFOSR (FA9550-10-1-0003) and NSF EPMD (ECCS-1101341). | ||||||||||||||||||||
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| Issue or Number: | 2 | ||||||||||||||||||||
| Classification Code: | OCIS codes: 350.4238, 310.1860, 310.6860 | ||||||||||||||||||||
| DOI: | 10.1364/JOSAB.29.000A55 | ||||||||||||||||||||
| Record Number: | CaltechAUTHORS:20120312-110035679 | ||||||||||||||||||||
| Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:20120312-110035679 | ||||||||||||||||||||
| Official Citation: | Michael Gehl, Ricky Gibson, Joshua Hendrickson, Andrew Homyk, Antti Säynätjoki, Tapani Alasaarela, Lasse Karvonen, Ari Tervonen, Seppo Honkanen, Sander Zandbergen, Benjamin C. Richards, J. D. Olitzky, Axel Scherer, Galina Khitrova, Hyatt M. Gibbs, Ju-Young Kim, and Yong-Hee Lee, "Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities," J. Opt. Soc. Am. B 29, A55-A59 (2012) | ||||||||||||||||||||
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | ||||||||||||||||||||
| ID Code: | 29688 | ||||||||||||||||||||
| Collection: | CaltechAUTHORS | ||||||||||||||||||||
| Deposited By: | Jason Perez | ||||||||||||||||||||
| Deposited On: | 12 Mar 2012 23:13 | ||||||||||||||||||||
| Last Modified: | 09 Nov 2021 19:28 |
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