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Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities

Gehl, Michael and Gibson, Ricky and Hendrickson, Joshua and Homyk, Andrew and Säynätjoki, Antti and Alaasarela, Tapani and Karvonen, Lasse and Tervonen, Ari and Honkanen, Seppo and Zandbergen, Sander and Richards, Benjamin C. and Olitzky, J. D. and Scherer, Axel and Khitrova, Galina and Gibbs, Hyatt M. and Kim, Ju-Young and Lee, Yong-Hee (2012) Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities. Journal of the Optical Society of America B, 29 (2). A55-A59. ISSN 0740-3224. doi:10.1364/JOSAB.29.000A55. https://resolver.caltech.edu/CaltechAUTHORS:20120312-110035679

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Abstract

In this work we study the effect of thin-film deposition on the quality factor (Q) of silicon nanobeam cavities. We observe an average increase in the Q of 38±31% in one sample and investigate the dependence of this increase on the initial nanobeam hole sizes. We note that this process can be used to modify cavities that have larger than optimal hole sizes following fabrication. Additionally, the technique allows the tuning of the cavity mode wavelength and the incorporation of new materials, without significantly degrading Q.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1364/JOSAB.29.000A55DOIUNSPECIFIED
http://www.opticsinfobase.org/josab/abstract.cfm?uri=josab-29-2-A55PublisherUNSPECIFIED
Additional Information:© 2012 Optical Society of America. Received October 4, 2011; revised December 12, 2011; accepted December 12, 2011; posted December 12, 2011 (Doc. ID 155915); published January 25, 2012. M. Gehl acknowledges support by the Department of Defense (DoD) through the National Defense Science & Engineering Graduate Fellowship (NDSEG) program. S. Zandbergen acknowledges partial support from Arizona Technology & Research Initiative Funding (TRIF). J. Hendrickson acknowledges support from the Air Force Office of Scientific Research (AFOSR)—LRIR 10RY04COR (Gernot Pomrenke, program manager). A. Homyk appreciates the generous support of the ARCS Foundation. A. Säynätjoki was supported by Academy of Finland grant 134087 and a travel grant by the Finnish Foundation for Technology Promotion. The Caltech and UofA groups thank NSF ERC CIAN (EEC-0812072) for support. The U of A group acknowledges support from the AFOSR (FA9550-10-1-0003) and NSF EPMD (ECCS-1101341).
Funders:
Funding AgencyGrant Number
Department of Defense (DoD) National Defense Science & Engineering Graduate Fellowship (NDSEG) ProgramUNSPECIFIED
Arizona Technology & Research Initiative Funding (TRIF)UNSPECIFIED
Air Force Office of Scientific Research (AFOSR)LRIR 10RY04COR
ARCS FoundationUNSPECIFIED
Academy of Finland134087
Finnish Foundation for Technology PromotionUNSPECIFIED
NSF ERC CIANEEC-0812072
Air Force Office of Scientific Research (AFOSR)FA9550-10-1-0003
NSF EPMDECCS-1101341
Issue or Number:2
Classification Code:OCIS codes: 350.4238, 310.1860, 310.6860
DOI:10.1364/JOSAB.29.000A55
Record Number:CaltechAUTHORS:20120312-110035679
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20120312-110035679
Official Citation:Michael Gehl, Ricky Gibson, Joshua Hendrickson, Andrew Homyk, Antti Säynätjoki, Tapani Alasaarela, Lasse Karvonen, Ari Tervonen, Seppo Honkanen, Sander Zandbergen, Benjamin C. Richards, J. D. Olitzky, Axel Scherer, Galina Khitrova, Hyatt M. Gibbs, Ju-Young Kim, and Yong-Hee Lee, "Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities," J. Opt. Soc. Am. B 29, A55-A59 (2012)
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:29688
Collection:CaltechAUTHORS
Deposited By: Jason Perez
Deposited On:12 Mar 2012 23:13
Last Modified:09 Nov 2021 19:28

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