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The Role of the Substrate on Pattern-Dependent Charging

Hwang, Gyeong S. and Giapis, Konstantinos P. (1997) The Role of the Substrate on Pattern-Dependent Charging. Journal of the Electrochemical Society, 144 (12). L320-L322. ISSN 0013-4651. doi:10.1149/1.1838146.

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Monte Carlo simulations of charging and profile evolution during plasma etching reveal that the substrate can mediate current imbalance across the wafer. This function couples patterned areas, where the electron shading effect dominates, to substrate areas directly exposed to the plasma. When a net positive current flows through the pattern features to the substrate, increasing the exposed area decreases the substrate potential, thereby causing notching at the connected feature sidewalls to worsen, in agreement with experimental observations.

Item Type:Article
Related URLs:
URLURL TypeDescription
Hwang, Gyeong S.0000-0002-5538-9426
Giapis, Konstantinos P.0000-0002-7393-298X
Additional Information:© 1997 The Electrochemical Society, Inc. Manuscript received Aug. 25, 1997. This work was supported by an NSF-Career Award and a Camille Dreyfus Teacher-Scholar Award to K.P.G. An Applied Materials Scholarship in partial support of G.S.H. is gratefully acknowledged. California Institute of Technology assisted in meeting the publication costs of this article.
Funding AgencyGrant Number
Camille and Henry Dreyfus FoundationUNSPECIFIED
Applied MaterialsUNSPECIFIED
Subject Keywords:Monte Carlo methods; plasma applications; etching; wafer-scale integration; tunnelling
Issue or Number:12
Record Number:CaltechAUTHORS:HWAjes97b
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Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:3001
Deposited By: Archive Administrator
Deposited On:10 May 2006
Last Modified:08 Nov 2021 19:52

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