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New fabrication techniques for high quality photonic crystals

Cheng, Chuan C. and Scherer, Axel and Tyan, Rong-Chung and Fainman, Yeshayahu and Witzgall, George and Yablonovitch, Eli (1997) New fabrication techniques for high quality photonic crystals. Journal of Vacuum Science and Technology B, 15 (6). pp. 2764-2767. ISSN 1071-1023. doi:10.1116/1.589723.

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We have developed new methods for the fabrication of high quality two-dimensional (2D) and three-dimensional (3D) photonic crystals. These techniques involve anisotropic etching and steam oxidation of AlAs mask layers. We have made manufacturable 2D photonic crystals with high aspect ratios for use as micropolarizers and have measured extinction ratios larger than 800 to 1 between TE and TM modes transmitted through these structures. The new Al2O3 mask fabrication technique also allows us to fabricate 3D structures with up to six repeating layers in depth and over 90% attenuation in the band gap region. Here, we show the fabrication details and performance of 2D and 3D photonic crystals.

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Yablonovitch, Eli0000-0002-5724-3375
Additional Information:©1997 American Vacuum Society. (Received 30 May 1997; accepted 6 August 1997) The authors greatly thank Reginald Lee and Professor Amnon Yariv for supplying the samples used in this work. This research was funded by Army Research Office and National Science Foundation.
Subject Keywords:photonic band gap; optical fabrication; optical polarisers
Issue or Number:6
Record Number:CaltechAUTHORS:CHEjvstb97
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Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:3228
Deposited By: Archive Administrator
Deposited On:23 May 2006
Last Modified:08 Nov 2021 19:54

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