Kräutle, H. and Nicolet, M-A. and Mayer, J. W. (1974) Kinetics of silicide formation by thin films of V on Si and SiO_2 substrates. Journal of Applied Physics, 45 (8). pp. 3304-3308. ISSN 0021-8979. doi:10.1063/1.1663776. https://resolver.caltech.edu/CaltechAUTHORS:20120809-110703213
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Abstract
The reaction rate of vacuum‐evaporated films of V of the order of 1000 Å thick is investigated by MeV He backscattering spectrometry. On substrates of single‐crystal Si and for anneal times up to several hours in the temperature range 570–650°C, VSi_2 is formed at a linear rate in time. The activation energy of the process is 1.7±0.2 eV. The presence of oxygen in amounts of 10% can significantly decelerate the reaction. On substrates of SiO_2 in the temperature range 730–820°C and anneal times of several hours or less, V_3Si is formed at a square‐root rate in time. The activation energy of this process is 2.0±0.2 eV.
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| Additional Information: | © 1974 American Institute of Physics. Received 6 February 1974. The authors acknowledge helpful discussions with W. K. Chu and J. O. McCaldin. They also thank K.-N. Tu, of IBM, Thomas J. Watson Research Center, for his collaboration and the x-ray analyses of silicide films. Work supported by the Air Force Cambridge Research Laboratory (D. E. Davies). | |||||||||
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| Issue or Number: | 8 | |||||||||
| DOI: | 10.1063/1.1663776 | |||||||||
| Record Number: | CaltechAUTHORS:20120809-110703213 | |||||||||
| Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:20120809-110703213 | |||||||||
| Official Citation: | Kinetics of silicide formation by thin films of V on Si and SiO[sub 2] substrates H. Krautle, M-A. Nicolet, and J. W. Mayer, J. Appl. Phys. 45, 3304 (1974), DOI:10.1063/1.1663776 | |||||||||
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | |||||||||
| ID Code: | 33050 | |||||||||
| Collection: | CaltechAUTHORS | |||||||||
| Deposited By: | INVALID USER | |||||||||
| Deposited On: | 09 Aug 2012 18:31 | |||||||||
| Last Modified: | 09 Nov 2021 21:32 |
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