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Dislocation velocity in single and polycrystalline silicon-iron

Moon, D. W. and Vreeland, T., Jr. (1968) Dislocation velocity in single and polycrystalline silicon-iron. Journal of Applied Physics, 39 (3). pp. 1766-1770. ISSN 0021-8979. doi:10.1063/1.1656427.

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The stress dependence of screw-dislocation velocity in single and polycrystalline specimens of an iron-3.14% silicon alloy was measured by observation of slip-band growth. An electrolytic etching technique was used to reveal dislocation intersections with the specimen surface, and slip bands were observed to form from fresh scratches and from grain boundaries as a result of pulse loading. Screw dislocation velocity on the {110} 111 system in single crystals at room temperature followed the relation ΰ = (τ/τ0)n, where n = 30.1. A plot of screw-dislocation velocity vs nominal resolved shear stress in individual grains of polycrystalline specimens shows considerable scatter which is attributed to the effects of stress variations due to elastic anisotropy. Observation of slip-band growth in scatched and unscratched grains indicates that the stress required to activate grain boundary sources is greater than the stress required to propagate fresh dislocations.

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Additional Information:©1968 The American Institute of Physics. Received 19 July 1967. The advice and encouragement of Professor D. S. Wood and Professor D. S. Clark throughout the course of this work is gratefully acknowledged. This work was sponsored by the U.S. Atomic Energy Commission.
Issue or Number:3
Record Number:CaltechAUTHORS:MOOjap68
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Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:3347
Deposited By: Tony Diaz
Deposited On:01 Jun 2006
Last Modified:08 Nov 2021 19:55

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