Kimball, Gregory M. and Bosco, Jeffrey P. and Müller, Astrid M. and Tajdar, Syed F. and Brunschwig, Bruce S. and Atwater, Harry A. and Lewis, Nathan S. (2012) Passivation of Zn_3P_2 substrates by aqueous chemical etching and air oxidation. Journal of Applied Physics, 112 (10). Art. No. 106101. ISSN 0021-8979. doi:10.1063/1.4765030. https://resolver.caltech.edu/CaltechAUTHORS:20130107-153109324
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Abstract
Surface recombination velocities measured by time-resolved photoluminescence and compositions of Zn_(3)P_2 surfaces measured by x-ray photoelectron spectroscopy (XPS) have been correlated for a series of wet chemical etches of Zn_(3)P_2 substrates. Zn_(3)P_2 substrates that were etched with Br_2 in methanol exhibited surface recombination velocity values of 2.8 × 10^4 cm s^(−1), whereas substrates that were further treated by aqueous HF–H_(2)O_2 exhibited surface recombination velocity values of 1.0 × 10^4 cm s^(−1). Zn_(3)P_2 substrates that were etched with Br_2 in methanol and exposed to air for 1 week exhibited surface recombination velocity values of 1.8 × 10^3 cm s^(−1), as well as improved ideality in metal/insulator/semiconductor devices.
| Item Type: | Article | ||||||||||||
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| Additional Information: | © 2012 American Institute of Physics. Received 3 May 2012; accepted 12 October 2012; published online 21 November 2012. This work was supported by the Department of Energy under Grant Nos. DE-FG02-03ER15483 and DE-FG36-08GO18006, by the Beckman Institute Laser Resource Center, and by the Dow Chemical Company. GMK acknowledges support by an NDSEG graduate fellowship and Jeffery W. Lefler is acknowledged for fabrication of a custom time-resolved photoluminescence chamber. | ||||||||||||
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| Subject Keywords: | etching; oxidation; passivation; photoluminescence; surface composition; surface recombination; time resolved spectra; wide band gap semiconductors; X-ray photoelectron spectra; zinc compounds | ||||||||||||
| Issue or Number: | 10 | ||||||||||||
| Classification Code: | PACS: 81.65.Rv; 82.80.Pv; 78.47.jd; 73.25.+i; 78.55.Hx; 81.65.Mq | ||||||||||||
| DOI: | 10.1063/1.4765030 | ||||||||||||
| Record Number: | CaltechAUTHORS:20130107-153109324 | ||||||||||||
| Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:20130107-153109324 | ||||||||||||
| Official Citation: | Passivation of Zn[sub 3]P[sub 2] substrates by aqueous chemical etching and air oxidation Gregory M. Kimball, Jeffrey P. Bosco, Astrid M. Muller, Syed F. Tajdar, Bruce S. Brunschwig, Harry A. Atwater, and Nathan S. Lewis, J. Appl. Phys. 112, 106101 (2012), DOI:10.1063/1.4765030 | ||||||||||||
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | ||||||||||||
| ID Code: | 36211 | ||||||||||||
| Collection: | CaltechAUTHORS | ||||||||||||
| Deposited By: | INVALID USER | ||||||||||||
| Deposited On: | 08 Jan 2013 00:28 | ||||||||||||
| Last Modified: | 09 Nov 2021 23:20 |
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