Chen, Tong and Lee, Hansuek and Li, Jiang and Vahala, Kerry (2012) Chemically-Etched Ultra-High-Q Micro-Cavities on a Silicon Chip. In: 2012 IEEE Photonics Conference (IPC). IEEE , Piscataway, NJ, pp. 262-263. ISBN 978-1-4577-0731-5. https://resolver.caltech.edu/CaltechAUTHORS:20130308-094240934
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Abstract
Optical resonators with quality factor as high as 875 million are demonstrated. These silicon-chip-based devices are fabricated using only lithography and chemical etching, thereby expanding integration opportunities and possible applications.
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| Additional Information: | © 2012 IEEE. This work was supported by DARPA. | |||||||||
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| Subject Keywords: | optical resonators, silicon-chip-based devices | |||||||||
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| Record Number: | CaltechAUTHORS:20130308-094240934 | |||||||||
| Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:20130308-094240934 | |||||||||
| Official Citation: | Tong Chen; Hansuek Lee; Jiang Li; Vahala, K., "Chemically-etched ultra-high-Q micro-cavities on a silicon chip," Photonics Conference (IPC), 2012 IEEE , vol., no., pp.262,263, 23-27 Sept. 2012 doi: 10.1109/IPCon.2012.6358592 | |||||||||
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | |||||||||
| ID Code: | 37409 | |||||||||
| Collection: | CaltechAUTHORS | |||||||||
| Deposited By: | Tony Diaz | |||||||||
| Deposited On: | 29 Mar 2013 22:03 | |||||||||
| Last Modified: | 09 Mar 2020 13:19 |
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