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Chemically-Etched Ultra-High-Q Micro-Cavities on a Silicon Chip

Chen, Tong and Lee, Hansuek and Li, Jiang and Vahala, Kerry (2012) Chemically-Etched Ultra-High-Q Micro-Cavities on a Silicon Chip. In: 2012 IEEE Photonics Conference (IPC). IEEE , Piscataway, NJ, pp. 262-263. ISBN 978-1-4577-0731-5.

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Optical resonators with quality factor as high as 875 million are demonstrated. These silicon-chip-based devices are fabricated using only lithography and chemical etching, thereby expanding integration opportunities and possible applications.

Item Type:Book Section
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URLURL TypeDescription
Lee, Hansuek0000-0002-0748-7662
Vahala, Kerry0000-0003-1783-1380
Additional Information:© 2012 IEEE. This work was supported by DARPA.
Funding AgencyGrant Number
Defense Advanced Research Projects Agency (DARPA)UNSPECIFIED
Subject Keywords:optical resonators, silicon-chip-based devices
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INSPEC Accession Number13149934
Record Number:CaltechAUTHORS:20130308-094240934
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Official Citation:Tong Chen; Hansuek Lee; Jiang Li; Vahala, K., "Chemically-etched ultra-high-Q micro-cavities on a silicon chip," Photonics Conference (IPC), 2012 IEEE , vol., no., pp.262,263, 23-27 Sept. 2012 doi: 10.1109/IPCon.2012.6358592
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:37409
Deposited By: Tony Diaz
Deposited On:29 Mar 2013 22:03
Last Modified:13 Apr 2022 17:06

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