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The Effect of He Implantation on the Tensile Properties and Microstructure of Cu/Fe Nano-Bicrystals

Landau, Peri and Guo, Q. and Hattar, K. and Greer, J. R. (2013) The Effect of He Implantation on the Tensile Properties and Microstructure of Cu/Fe Nano-Bicrystals. Advanced Functional Materials, 23 (10). pp. 1281-1288. ISSN 1616-301X. doi:10.1002/adfm.201201776. https://resolver.caltech.edu/CaltechAUTHORS:20130412-141442900

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Abstract

In situ uniaxial tensile experiments on as-fabricated and helium-implanted 100 nm-diameter Cu/Fe bicrystals unearth the effect of individual face-centred-cubic/body-centred-cubic (fcc-bcc) interfaces on improving radiation-damage tolerance and helium absorption. Arrays of nanotensile specimens, each containing a single Cu grain in the bottom half and a single Fe grain on top, were fabricated by templated electron-beam lithography and electrodeposition. Helium is implanted at 200 keV to a dose of 10^(14) ion/cm^2 nominally into the interface region. High-resolution, site-specific transmission electron microscopy (TEM) and through-focus analysis reveal that the interfaces are nonplanar and contain ≈5 nm-spaced He bubbles with diameters of 1–2 nm. Nanomechanical experimental results show that the irradiated samples exhibit yield and ultimate tensile strengths more than 60% higher than the as-fabricated ones, while they retain comparable ductility. Tensile failure always occurs gradually, along the interfaces, with no noticeable shape localization. The absence of brittle failure in He-irradiated metals might be explained, in part, by the inability of the small He bubbles to serve as sufficient stress concentrators for cracking. In addition, the non-orthogonal orientation of the interfaces with respect to the loading axes results in the development of both normal- and shear-stress components. Tensile loading along the pillar axes may cause those interfacial regions subjected to normal stresses to detach, while the inclined regions, subjected to shear, to carry plastic deformation until final fracture.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1002/adfm.201201776DOIArticle
http://onlinelibrary.wiley.com/doi/10.1002/adfm.201201776/abstractPublisherArticle
ORCID:
AuthorORCID
Greer, J. R.0000-0002-9675-1508
Additional Information:© 2013 Wiley-VCH Verlag GmbH & Co. Issue published online: 7 Mar 2013. Article first published online: 12 Oct 2012. Manuscript Revised: 11 Sep 2012. Manuscript Received: 28 Jun 2012. The authors gratefully acknowledge the financial support of the US Department of Energy, Office of Basic Energy Sciences through JRG’s Early Career grant. The authors also acknowledge support and infrastructure provided by the Kavli Nanoscience Institute (KNI) at Caltech and useful discussions with M. Demkowicz. P.L. thanks A. T. Jennings for help in mechanical data analysis. Helium implantation was supported by the Division of Materials Science and Engineering, Office of Basic Energy Sciences, US Department of Energy. Sandia National Laboratories is a multiprogram laboratory managed and operated by Sandia Corporation, a wholly owned subsidiary of Lockheed Martin Company, for the US Department of Energy’s National Nuclear Security Administration under contract DE-AC04-94AL85000.
Group:Kavli Nanoscience Institute
Funders:
Funding AgencyGrant Number
Kavli Nanoscience InstituteUNSPECIFIED
Department of Energy (DOE)DE-AC04-94AL85000
Subject Keywords:tensile tests; interfacial strength; helium implantation; mechanical properties
Issue or Number:10
DOI:10.1002/adfm.201201776
Record Number:CaltechAUTHORS:20130412-141442900
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20130412-141442900
Official Citation:Landau, P., Guo, Q., Hattar, K. and Greer, J. R. (2013), The Effect of He Implantation on the Tensile Properties and Microstructure of Cu/Fe Nano-Bicrystals. Adv. Funct. Mater., 23: 1281–1288. doi: 10.1002/adfm.201201776
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:37918
Collection:CaltechAUTHORS
Deposited By: Ruth Sustaita
Deposited On:12 Apr 2013 21:54
Last Modified:09 Nov 2021 23:32

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