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Rapid biaxial texture development during nucleation of MgO thin films during ion beam-assisted deposition

Brewer, Rhett T. and Atwater, Harry A. (2002) Rapid biaxial texture development during nucleation of MgO thin films during ion beam-assisted deposition. Applied Physics Letters, 80 (18). pp. 3388-3390. ISSN 0003-6951. doi:10.1063/1.1476385.

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We propose a mechanism for the nucleation of highly aligned biaxially textured MgO on amorphous Si3N4 during ion beam-assisted deposition. Using transmission electron microscopy, reflection high-energy electron diffraction, energy dispersive x-ray analysis, and ellipsometery, we have observed that highly aligned biaxially textured grains emerge from a "diffraction-amorphous" film when the film thickens from 3.5 to 4.5 nm. Transmission electron microscopy dark-field images also show the onset of rapid grain growth during this same film thickness interval. These results suggest biaxial texturing through aligned solid phase crystallization.

Item Type:Article
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Atwater, Harry A.0000-0001-9435-0201
Additional Information:© 2002 American Institute of Physics. Received 8 February 2002; accepted 5 March 2002. This work was supported by the DARPA VIP III program, ARO MURI Grant No. DAAD 19-01-1-0517, and the Intel Foundation.
Funding AgencyGrant Number
Defense Advanced Research Projects Agency (DARPA)UNSPECIFIED
Army Research Office (ARO)DAAD 19-01-1-0517
Intel FoundationUNSPECIFIED
Subject Keywords:magnesium compounds; ion beam assisted deposition; nucleation; transmission electron microscopy; reflection high energy electron diffraction; X-ray chemical analysis; ellipsometry; grain growth; crystallisation; texture
Issue or Number:18
Record Number:CaltechAUTHORS:BREapl02
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Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:3829
Deposited By: Tony Diaz
Deposited On:13 Jul 2006
Last Modified:08 Nov 2021 20:12

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