Jabbour, M. and Bhattacharya, K. (1999) A multispecies step-flow model of growth of compound thin films by MOCVD. Thin Solid Films, 357 (1). pp. 26-30. ISSN 0040-6090. doi:10.1016/S0040-6090(99)00469-1. https://resolver.caltech.edu/CaltechAUTHORS:20131008-110352649
Full text is not posted in this repository. Consult Related URLs below.
Use this Persistent URL to link to this item: https://resolver.caltech.edu/CaltechAUTHORS:20131008-110352649
Abstract
This paper presents a model of step-flow-mediated growth of a multispecies stoichiometric compound in the setting of MOCVD. The gas phase delivers adatoms of the different species to the terraces; these adatoms diffuse along the terraces until they reach the steps where they react to form the compound which is incorporated into the film. The model shows that possible blocking of open sites on the terrace and non-linear kinetics at the steps give rise to an unusual dependence of the deposition flux (growth rate) on the gas phase composition. A methodology for coupling this step-flow model to reactor-scale gas phase models is also proposed, and shown to be linearly stable.
| Item Type: | Article | |||||||||
|---|---|---|---|---|---|---|---|---|---|---|
| Related URLs: |
| |||||||||
| ORCID: |
| |||||||||
| Additional Information: | © 1999 Elsevier Science S.A. It is a pleasure to thank D.G. Goodwin, R.V. Kohn, R.V. Kukta, L. Raja and E. Repetto for many useful discussions. Support from the National Science Foundation and the Defense Advanced Research Projects Agency under the initiative 'Modeling and Simulation of Advanced Materials Processes: Virtual Integrated Prototyping Initiative for Thin Films' is gratefully acknowledged. | |||||||||
| Funders: |
| |||||||||
| Issue or Number: | 1 | |||||||||
| DOI: | 10.1016/S0040-6090(99)00469-1 | |||||||||
| Record Number: | CaltechAUTHORS:20131008-110352649 | |||||||||
| Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:20131008-110352649 | |||||||||
| Official Citation: | M. Jabbour, K. Bhattacharya, A multispecies step-flow model of growth of compound thin films by MOCVD, Thin Solid Films, Volume 357, Issue 1, 1 December 1999, Pages 26-30, ISSN 0040-6090, http://dx.doi.org/10.1016/S0040-6090(99)00469-1. (http://www.sciencedirect.com/science/article/pii/S0040609099004691) | |||||||||
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | |||||||||
| ID Code: | 41740 | |||||||||
| Collection: | CaltechAUTHORS | |||||||||
| Deposited By: | Tony Diaz | |||||||||
| Deposited On: | 08 Oct 2013 21:55 | |||||||||
| Last Modified: | 10 Nov 2021 04:33 |
Repository Staff Only: item control page
