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A multispecies step-flow model of growth of compound thin films by MOCVD

Jabbour, M. and Bhattacharya, K. (1999) A multispecies step-flow model of growth of compound thin films by MOCVD. Thin Solid Films, 357 (1). pp. 26-30. ISSN 0040-6090. doi:10.1016/S0040-6090(99)00469-1.

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This paper presents a model of step-flow-mediated growth of a multispecies stoichiometric compound in the setting of MOCVD. The gas phase delivers adatoms of the different species to the terraces; these adatoms diffuse along the terraces until they reach the steps where they react to form the compound which is incorporated into the film. The model shows that possible blocking of open sites on the terrace and non-linear kinetics at the steps give rise to an unusual dependence of the deposition flux (growth rate) on the gas phase composition. A methodology for coupling this step-flow model to reactor-scale gas phase models is also proposed, and shown to be linearly stable.

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Bhattacharya, K.0000-0003-2908-5469
Additional Information:© 1999 Elsevier Science S.A. It is a pleasure to thank D.G. Goodwin, R.V. Kohn, R.V. Kukta, L. Raja and E. Repetto for many useful discussions. Support from the National Science Foundation and the Defense Advanced Research Projects Agency under the initiative 'Modeling and Simulation of Advanced Materials Processes: Virtual Integrated Prototyping Initiative for Thin Films' is gratefully acknowledged.
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Defense Advanced Research Projects Agency (DARPA)UNSPECIFIED
Issue or Number:1
Record Number:CaltechAUTHORS:20131008-110352649
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Official Citation:M. Jabbour, K. Bhattacharya, A multispecies step-flow model of growth of compound thin films by MOCVD, Thin Solid Films, Volume 357, Issue 1, 1 December 1999, Pages 26-30, ISSN 0040-6090, (
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:41740
Deposited By: Tony Diaz
Deposited On:08 Oct 2013 21:55
Last Modified:10 Nov 2021 04:33

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