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Resonance ionization mass spectrometry of sputtered osmium and rhenium atoms

Blum, Joel D. and Pellin, M. J. and Calaway, W. F. and Young, C. E. and Gruen, D. M. and Hutcheon, I. D. and Wasserburg, G. J. (1990) Resonance ionization mass spectrometry of sputtered osmium and rhenium atoms. Analytical Chemistry, 62 (2). pp. 209-214. ISSN 0003-2700. https://resolver.caltech.edu/CaltechAUTHORS:20131029-091342721

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Abstract

The mass spectrometric analysis of Os and Re was investigated by use of a pulsed primary Ar^+ ion beam to provide sputtered atoms for resonance ionization mass spectrometry. A useful yield of 10^(-2) and a detection limit of 8 ppb were demonstrated for Os concentration measurement. In situ measurements of Os concentration are obtainable by this method at the sub-part-per-million level in conducting and semiconducting materials with a full width at half maximum beam diameter of ~70 µm. An ionization scheme for Os that utilizes three resonant energy levels (including an autoionizing energy level) was investigated and found to have superior sensitivity and selectivity compared to nonresonant and one and two energy level resonant ionization schemes. An elemental selectivity for Os over Re of ≥10^3 was demonstrated. It was found that detuning the ionizing laser from the autoionizing energy level to an arbitrary region in the Ionization continuum resulted in a 5-fold decrease in signal intensity and a 10-fold decrease in elemental selectivity.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1021/ac00201a022 DOIArticle
http://pubs.acs.org/doi/abs/10.1021/ac00201a022PublisherArticle
ORCID:
AuthorORCID
Gruen, D. M.0000-0003-3270-7644
Additional Information:© 1990 American Chemical Society. Received for review May 9, 1989. Accepted October 24, 1989. This study was performed as part of a doctoral dissertation by the senior author at the California Institute of Technology (Caltech). Work was supported by the U.S. Department of Energy through BES-Material Sciences Contract W-31-109- ENG-38 to Argonne National Laboratory and BES-Engineering and Geosciences Grant DE-FG03-88ER13851 to Caltech. Caltech Division of Geological and Planetary Sciences Contribution Number 4759 (675). We thank three anonymous reviewers, J. Whitten for technical assistance, J. Wasson for providing meteorite specimens, J. Blake for comments, and E. Stolper and G. Rossman for the use of furnaces.
Funders:
Funding AgencyGrant Number
Department of Energy (DOE)W-31-109-ENG-38
Department of Energy (DOE)DE-FG03-88ER13851
Other Numbering System:
Other Numbering System NameOther Numbering System ID
Caltech Division of Geological and Planetary Sciences4759
Lunatic Asylum Lab675
Issue or Number:2
Record Number:CaltechAUTHORS:20131029-091342721
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20131029-091342721
Official Citation:Resonance ionization mass spectrometry of sputtered osmium and rhenium atoms Joel D. Blum, M. J. Pellin, W. F. Calaway, C. E. Young, D. M. Gruen, I. D. Hutcheon, and G. J. Wasserburg Analytical Chemistry 1990 62 (2), 209-214
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:42107
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:01 Nov 2013 21:45
Last Modified:03 Oct 2019 05:55

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