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Photolithographic Olefin Metathesis Polymerization

Weitekamp, Raymond A. and Atwater, Harry A. and Grubbs, Robert H. (2013) Photolithographic Olefin Metathesis Polymerization. Journal of the American Chemical Society, 135 (45). pp. 16817-16820. ISSN 0002-7863. doi:10.1021/ja4093083.

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Patterning functional materials is a central challenge across many fields of science. The ability to lithographically fabricate micro- and nanostructures has been one of the most impactful technological breakthroughs of the last century. In part due to the complexity of the chemical processes in photoresists, there is a limited variety of materials that can currently be patterned by photolithography. We report a negative tone photoresist using a photoactivated olefin metathesis catalyst, which can be quickly prepared in a one-pot synthesis from commercially available starting materials. The resist is based on a ruthenium vinyl ether complex, widely regarded as inactive toward olefin metathesis. The combination of this photoactivated catalyst with the fidelity and functional group tolerance of ruthenium-mediated olefin metathesis enables a host of new possibilities for photopatterned materials.

Item Type:Article
Related URLs:
URLURL TypeDescription Information
Atwater, Harry A.0000-0001-9435-0201
Grubbs, Robert H.0000-0002-0057-7817
Additional Information:Copyright © 2013 American Chemical Society. Received September 9, 2013. Publication Date (Web): October 30, 2013. This work is part of the Light-Material Interactions in Energy Conversion Energy Frontier Research Center funded by the U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences under Award Number DE-SC0001293. This research was conducted with Government support under and awarded by DoD, Air Force Office of Scientific Research, National Defense Science and Engineering Graduate (NDSEG) Fellowship, 32 CFR 168a, awarded to R.A.W. Profilometry was performed at the Molecular Materials Research Center of the Beckman Institute of the California Institute of Technology. R.A.W. thanks the Resnick Sustainability Institute for a graduate fellowship, and Jim Fakonas for many helpful discussions.
Group:Resnick Sustainability Institute
Funding AgencyGrant Number
Resnick Sustainability InstituteUNSPECIFIED
Department of Energy (DOE)DE-SC0001293
National Defense Science and Engineering Graduate (NDSEG) Fellowship32 CFR 168a
Subject Keywords:radiation chemistry, photochemistry, retrographic processes
Issue or Number:45
Record Number:CaltechAUTHORS:20131030-112906993
Persistent URL:
Official Citation:Photolithographic Olefin Metathesis Polymerization Raymond A. Weitekamp, Harry A. Atwater, and Robert H. Grubbs Journal of the American Chemical Society 2013 135 (45), 16817-16820
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:42140
Deposited By: Heidi Rusina
Deposited On:31 Oct 2013 21:13
Last Modified:10 Nov 2021 16:18

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