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Fabrication of bismuth nanowires with a silver nanocrystal shadowmask

Choi, S. H. and Wang, K. L. and Leung, M. S. and Stupian, G. W. and Presser, N. and Morgan, B. A. and Robertson, R. E. and Abraham, M. and King, E. E. and Tueling, M. B. and Chung, S. W. and Heath, J. R. and Cho, S. L. and Ketterson, J. B. (2000) Fabrication of bismuth nanowires with a silver nanocrystal shadowmask. Journal of Vacuum Science and Technology A, 18 (4). pp. 1326-1328. ISSN 0734-2101. doi:10.1116/1.582348.

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We fabricated bismuth (Bi) nanowires with low energy electron beam lithography using silver (Ag) nanocrystal shadowmasks and a subsequent chlorine reactive ion etching. Submicron-size metal contacts on the single Bi nanowire were successfully prepared by in situ focused ion beam metal deposition for transport measurements. The temperature dependent resistance measurements on the 50 nm wide Bi nanowires showed that the resistance increased with decreasing temperature, which is characteristic of semiconductors and insulators.

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Heath, J. R.0000-0001-5356-4385
Additional Information:© 2000 American Vacuum Society. (Received 1 October 1999; accepted 3 January 2000) The authors gratefully acknowledge support by the Augmentation Awards for Science and Engineering Research Training (AASERT) Fellowship Grant No. N00014-96-1-1258, the Office of Naval Research MURI, and ARO MURI and the U.S. Air Force under Contract No. F04701-93-C-0094. One of the authors (J.R.H.) acknowledges the Office of Naval Research Contract No. N00014-981-0422, and the Packard Foundation. PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY
Funding AgencyGrant Number
Augmentation Awards for Science & Engineering Research Training (AASERT) Fellowship GrantN00014-96-1-1258
Office of Naval Research (ONR)UNSPECIFIED
Army Research Office (ARO)UNSPECIFIED
Office of Naval Research (ONR)N00014-981-0422
David and Lucile Packard FoundationUNSPECIFIED
Subject Keywords:bismuth; quantum wires; nanostructured materials; nanotechnology; masks; electron beam lithography; sputter etching; focused ion beam technology; ion beam assisted deposition; electrical resistivity
Issue or Number:4
Record Number:CaltechAUTHORS:CHOjvsta00
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Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:4234
Deposited By: Archive Administrator
Deposited On:08 Aug 2006
Last Modified:08 Nov 2021 20:15

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