Boyd, David A. (2013) Block Copolymer Lithography. In: New and future developments in catalysis: catalysis by nanoparticles. Elsevier , Amsterdam, pp. 305-332. ISBN 978-0-444-53874-1. https://resolver.caltech.edu/CaltechAUTHORS:20131118-112325692
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Abstract
This chapter presents block copolymer lithography (BCPL) in light of engineering nanoscale architectures for catalytic applications. It begins with an introduction to the basic phenomenology of block copolymers and then follows with highlights of recent advances in block copolymer science. An overview of the methods and materials commonly used in BCPL is provided. Important results involving BCPL in current research including heterogeneous catalysis, advanced material growth, and plasmonics are presented. Finally, challenges and outlook for BCPL are discussed.
Item Type: | Book Section | |||||||||
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Additional Information: | © 2013 Elsevier B. V. | |||||||||
Subject Keywords: | Block copolymers, Nanoparticles, Catalysis, Plasmonics, Nanowires | |||||||||
DOI: | 10.1016/B978-0-444-53874-1.00013-5 | |||||||||
Record Number: | CaltechAUTHORS:20131118-112325692 | |||||||||
Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:20131118-112325692 | |||||||||
Official Citation: | David A. Boyd, Chapter 13 - Block Copolymer Lithography, In New and Future Developments in Catalysis, edited by Steven L. Suib, Elsevier, Amsterdam, 2013, Pages 305-332, ISBN 9780444538741, http://dx.doi.org/10.1016/B978-0-444-53874-1.00013-5. (http://www.sciencedirect.com/science/article/pii/B9780444538741000135) | |||||||||
Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | |||||||||
ID Code: | 42526 | |||||||||
Collection: | CaltechAUTHORS | |||||||||
Deposited By: | Tony Diaz | |||||||||
Deposited On: | 18 Nov 2013 19:54 | |||||||||
Last Modified: | 10 Nov 2021 16:24 |
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