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Block Copolymer Lithography

Boyd, David A. (2013) Block Copolymer Lithography. In: New and future developments in catalysis: catalysis by nanoparticles. Elsevier , Amsterdam, pp. 305-332. ISBN 978-0-444-53874-1. https://resolver.caltech.edu/CaltechAUTHORS:20131118-112325692

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Abstract

This chapter presents block copolymer lithography (BCPL) in light of engineering nanoscale architectures for catalytic applications. It begins with an introduction to the basic phenomenology of block copolymers and then follows with highlights of recent advances in block copolymer science. An overview of the methods and materials commonly used in BCPL is provided. Important results involving BCPL in current research including heterogeneous catalysis, advanced material growth, and plasmonics are presented. Finally, challenges and outlook for BCPL are discussed.


Item Type:Book Section
Related URLs:
URLURL TypeDescription
http://www.sciencedirect.com/science/article/pii/B9780444538741000135PublisherArticle
http://dx.doi.org/10.1016/B978-0-444-53874-1.00013-5DOIArticle
Additional Information:© 2013 Elsevier B. V.
Subject Keywords:Block copolymers, Nanoparticles, Catalysis, Plasmonics, Nanowires
DOI:10.1016/B978-0-444-53874-1.00013-5
Record Number:CaltechAUTHORS:20131118-112325692
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20131118-112325692
Official Citation:David A. Boyd, Chapter 13 - Block Copolymer Lithography, In New and Future Developments in Catalysis, edited by Steven L. Suib, Elsevier, Amsterdam, 2013, Pages 305-332, ISBN 9780444538741, http://dx.doi.org/10.1016/B978-0-444-53874-1.00013-5. (http://www.sciencedirect.com/science/article/pii/B9780444538741000135)
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:42526
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:18 Nov 2013 19:54
Last Modified:10 Nov 2021 16:24

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