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On the Self-Assembly of Brush Block Copolymers in Thin Films

Hong, Sung Woo and Gu, Weiyin and Huh, June and Sveinbjornsson, Benjamin R. and Jeong, Gajin and Grubbs, Robert Howard and Russell, Thomas P. (2013) On the Self-Assembly of Brush Block Copolymers in Thin Films. ACS Nano, 7 (11). pp. 9684-9692. ISSN 1936-0851 . http://resolver.caltech.edu/CaltechAUTHORS:20140106-083231491

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Abstract

We describe a simple route to fabricate two dimensionally well-ordered, periodic nanopatterns using the self-assembly of brush block copolymers (brush BCPs). Well-developed lamellar microdomains oriented perpendicular to the substrate are achieved, without modification of the underlying substrates, and structures with feature sizes greater than 200 nm are generated due to the reduced degree of chain entanglements of brush BCPs. A near-perfect linear scaling law was found for the period, L, as a function of backbone degree of polymerization (DP) for two series of brush BCPs. The exponent increases slightly from 0.99 to 1.03 as the side chain molecular weight increases from 2.4 to 4.5 kg/mol^(–1) and saturated with further increase in the side chain molecular weight due to the entropic penalty associated with the packing of the side chains. Porous templates and scaffolds from brush BCP thin films are also obtained by selective etching of one component.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1021/nn402639g DOIArticle
http://pubs.acs.org/doi/abs/10.1021/nn402639gPublisherArticle
ORCID:
AuthorORCID
Grubbs, Robert Howard0000-0002-0057-7817
Additional Information:© 2013 American Chemical Society. Received for review May 24, 2013 and accepted October 24, 2013. Published online October 24, 2013. This work was supported by the U.S. Department of Energy (DOE), Office of Basic Energy Sciences under contract DEFG02-96ER45612 (SWH, WG and GJ were partially supported through DEFG02-96ER45612 and performed the samples preparation and x-ray scattering measurements under the guidance of TPR). BRS, supported by the Dow-Resnick Bridge award and the NSF (CHE-1048404), performed the synthesis of the materials under the guidance of RHG. JH, supported through Samsung Display, performed the theoretical calculations. We thank D. H. Lee and X. Gu for assistance with the GI-SAXS and GI-WAXS measurements; we thank W. Zhao for assistance with the TEM measurements. We thank Y. Xia for useful discussions on the synthesis of the brush BCPs. Use of the Advanced Light Source at the Lawrence Berkeley National Laboratory is acknowledged. The Advanced Light Source is supported by the Director, Office of Science, Office of Basic Energy Sciences, Material Science Division of the U.S. Department of Energy under Contract No. DE-AC02-05CH11231 at Lawrence Berkeley National Laboratory.
Group:Resnick Sustainability Institute
Funders:
Funding AgencyGrant Number
Department of Energy (DOE)DE-FG02-96ER45612
Dow-Resnick Bridge AwardUNSPECIFIED
NSFCHE-1048404
Department of Energy (DOE)DE-AC02-05CH11231
Samsung DisplayUNSPECIFIED
Subject Keywords:brush polymers; solvent-annealing; self-assembly; periodic nanopatterns; large feature sizes
Record Number:CaltechAUTHORS:20140106-083231491
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20140106-083231491
Official Citation:On the Self-Assembly of Brush Block Copolymers in Thin Films Sung Woo Hong, Weiyin Gu, June Huh, Benjamin R. Sveinbjornsson, Gajin Jeong, Robert Howard Grubbs, and Thomas P. Russell ACS Nano 2013 7 (11), 9684-9692
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:43212
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:09 Jan 2014 16:40
Last Modified:07 Dec 2016 23:21

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