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Semiconductor electrochemical treatment of domestic wastewater coupled with the production of molecular hydrogen

Hoffmann, Michael R. and Cid, Clément and Qu, Yan and Cho, Kangwoo (2014) Semiconductor electrochemical treatment of domestic wastewater coupled with the production of molecular hydrogen. In: 248th American Chemical Society National Meeting & Exposition, August 10-14, 2014, San Francisco, CA.

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We have developed a wastewater treatment system that incorporates an electrolysis cell for on-site wastewater treatment coupled with hydrogen prodn. for use in a hydrogen fuel cell. Herein, we report on the efficacy of a lab.-scale wastewater electrolysis cell (WEC) using real human waste for the first time with semiconductor electrode utilizing a mixed particle coating of bismuth oxide doped titanium dioxide (BiO_x/TiO_2). A comprehensive environmental anal. has been coupled together with a robust kinetic model under the chem. reaction limited regime to investigate the role of various redox reactions mediated by chloride present in human waste. The oxidative elimination of the COD (COD) and ammonium ion can be modelled using empirical, pseudo first-order rate consts. and current efficiencies (CE). In combination with an anaerobic pre-treatment step, human waste contg. high-levels of COD, protein, and color is eliminated within 6 h of treatment in the WEC. The reactor effluent has residual inorg. total nitrogen (TN) concn. of ∼40 mM. The CE and specific energy consumption were 8.5% and 200 kWh kg/CODfor COD removal and 11% and 260 for kWh kgTN^(-1) for the TN conversion. The CE and energy efficiencies (EE) for hydrogen prodn. were calcd. to be 90% and 25%, resp.

Item Type:Conference or Workshop Item (Paper)
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URLURL TypeDescription Website
Hoffmann, Michael R.0000-0001-6495-1946
Cid, Clément0000-0002-7293-035X
Additional Information:© 2014 American Chemical Society.
Record Number:CaltechAUTHORS:20140814-153553966
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Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:48578
Deposited By: Tony Diaz
Deposited On:25 Aug 2014 04:45
Last Modified:03 Mar 2020 13:01

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