Hoffmann, Michael R. and Cho, Kangwoo (2014) Effects of anodic potential and chloride ion on overall reactivity in semiconductor electrochemical reactors. In: 248th American Chemical Society National Meeting & Exposition, August 10-14, 2014, San Francisco, CA. https://resolver.caltech.edu/CaltechAUTHORS:20140815-084944307
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Abstract
We have investigated electrochem. treatment of real domestic wastewater coupled with simultaneous prodn. of mol. H2 as useful byproduct. The electrolysis cells employ multi-layer semiconductor anodes with electro-active bismuth-doped TiO2 functionalities and stainless steel cathodes. DC-powered Lab.-scale electrolysis expts. were performed under static anodic potentials (+2.2 or +3.0 V NHE) using domestic wastewater samples, with added chloride ion in variable concns. Greater than 95% redns. in COD (COD) and ammonium ion were achieved within 6 h. In addn., we exptl. detd. a decreasing overall reactivity of reactive chlorine species towards COD with an increasing chloride ion concn. under chlorine radicals (Cl·, Cl2-·) generation at +3.0 V NHE. The current efficiency for COD removal was 12% with the lowest specific energy consumption of 96 kWh kg/COD at the cell voltage of near 4 V in 50 mM chloride. The current efficiency and energy efficiency for H2 generation were calcd. to range from 34 to 84% and 14 to 26%, resp. The hydrogen comprised 35 to 60% by vol. of evolved gases. The efficacy of our electrolysis cell was further demonstrated by a 20 L prototype reactor totally powered by a photovoltaic (PV) panel, which was shown to eliminate COD and total coliform bacteria in less than 4 h of treatment.
Item Type: | Conference or Workshop Item (Paper) | ||||||
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Additional Information: | © 2014 American Chemical Society. | ||||||
Record Number: | CaltechAUTHORS:20140815-084944307 | ||||||
Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:20140815-084944307 | ||||||
Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | ||||||
ID Code: | 48592 | ||||||
Collection: | CaltechAUTHORS | ||||||
Deposited By: | Tony Diaz | ||||||
Deposited On: | 25 Aug 2014 04:38 | ||||||
Last Modified: | 03 Mar 2020 13:01 |
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