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Fracture strength of free‐standing chemically vapor‐deposited diamond films

Steyer, Todd E. and Faber, K. T. and Drory, Michael D. (1995) Fracture strength of free‐standing chemically vapor‐deposited diamond films. Applied Physics Letters, 66 (23). pp. 3105-3107. ISSN 0003-6951. doi:10.1063/1.113617. https://resolver.caltech.edu/CaltechAUTHORS:20140908-181327215

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Abstract

The fracture strength of free‐standing chemically vapor‐deposited diamond films was assessed by four‐point bending. A two‐parameter Weibull analysis was performed on 130 μm thick films resulting in a Weibull modulus of 4.3 and a statistical scaling stress of 626 MPa. The residual stress in films was measured from the free‐standing film curvature to be 384±10 MPa. The fracture surface chemistry was examined using scanning Auger spectroscopy. The fracture did not occur preferentially along grain boundaries.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1063/1.113617DOIArticle
http://scitation.aip.org/content/aip/journal/apl/66/23/10.1063/1.113617PublisherArticle
ORCID:
AuthorORCID
Faber, K. T.0000-0001-6585-2536
Additional Information:© 1995 American Institute of Physics. (Received 11 October 1994; accepted for publication 18 March 1995). The authors wish to thank D. Spaulding and Y.-W. Chung for their assistance in scanning Auger spectroscopy analysis. Support of this work was provided by the National Science Foundation under Grant No. DMR-9023629 for T.E.S. and K.T.F. and Grant No. III-9360024 for M.D.D.
Funders:
Funding AgencyGrant Number
NSFDMR-9023629
NSFIII-9360024
Issue or Number:23
DOI:10.1063/1.113617
Record Number:CaltechAUTHORS:20140908-181327215
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20140908-181327215
Official Citation:Fracture strength of free‐standing chemically vapor‐deposited diamond films Steyer, Todd E. and Faber, K. T. and Drory, Michael D., Applied Physics Letters, 66, 3105-3107 (1995), DOI:http://dx.doi.org/10.1063/1.113617
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:49425
Collection:CaltechAUTHORS
Deposited By: George Porter
Deposited On:10 Sep 2014 15:59
Last Modified:10 Nov 2021 18:44

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