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Nanoscale Conducting Oxide PlasMOStor

Lee, Ho W. and Papadakis, Georgia and Burgos, Stanley P. and Chander, Krishnan and Kriesch, Arian and Pala, Ragip A. and Peschel, Ulf and Atwater, Harry A. (2014) Nanoscale Conducting Oxide PlasMOStor. Nano Letters, 14 (11). pp. 6463-6468. ISSN 1530-6984. doi:10.1021/nl502998z. https://resolver.caltech.edu/CaltechAUTHORS:20141020-115917239

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Abstract

We experimentally demonstrate an ultracompact PlasMOStor, a plasmon slot waveguide field-effect modulator based on a transparent conducting oxide active region. By electrically modulating the conducting oxide material deposited into the gaps of highly confined plasmonic slot waveguides, we demonstrate field-effect dynamics giving rise to modulation with high dynamic range (2.71 dB/μm) and low waveguide loss (∼0.45 dB/μm). The large modulation strength is due to the large change in complex dielectric function when the signal wavelength approaches the surface plasmon resonance in the voltage-tuned conducting oxide accumulation layer. The results provide insight about the design of ultracompact, nanoscale modulators for future integrated nanophotonic circuits.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1021/nl502998zDOIArticle
http://pubs.acs.org/doi/suppl/10.1021/nl502998zPublisherSupporting Information
ORCID:
AuthorORCID
Papadakis, Georgia0000-0001-8107-9221
Atwater, Harry A.0000-0001-9435-0201
Additional Information:© 2014 American Chemical Society. Received: August 5, 2014; revised: October 3, 2014. Publication Date (Web): October 10, 2014. This work was supported by the Multidisciplinary University Research Initiative Grant (Air Force Office of Scientific Research, FA9550-12-1-0024) and used facilities supported by the DOE ‘Light-Material Interactions in Energy Conversion’ Energy Frontier Research Center under grant DE-SC0001293 and the Kavli Nanoscience Institute (KNI) at Caltech. H.W.L. acknowledges the Croucher Foundation of Hong Kong. G.P. and S.P.B. acknowledge the National Science Foundation. A.K. and U.P. acknowledge funding of the German Research Foundation (DFG) through the Cluster of Excellence Engineering of Advanced Materials (EAM) and the Erlangen Graduate School in Advanced Optical Technologies (SAOT).
Group:Kavli Nanoscience Institute
Funders:
Funding AgencyGrant Number
Air Force Office of Scientific Research (AFOSR)FA9550-12-1-0024
Department of Energy (DOE)DE-SC0001293
Kavli Nanoscience InstituteUNSPECIFIED
Croucher FoundationUNSPECIFIED
Subject Keywords:Plasmonics; transparent conducting oxide; modulator; field-effect modulation; epsilon near-zero material; nanocircuits; plasmonic slot waveguide; active plasmonics
Issue or Number:11
DOI:10.1021/nl502998z
Record Number:CaltechAUTHORS:20141020-115917239
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20141020-115917239
Official Citation:Nanoscale Conducting Oxide PlasMOStor Ho W. Lee, Georgia Papadakis, Stanley P. Burgos, Krishnan Chander, Arian Kriesch, Ragip Pala, Ulf Peschel, and Harry A. Atwater Nano Letters 2014 14 (11), 6463-6468
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:50553
Collection:CaltechAUTHORS
Deposited By:INVALID USER
Deposited On:21 Oct 2014 15:38
Last Modified:10 Nov 2021 18:57

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