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Sputtering of UF_4 by high energy heavy ions

Meins, C. K. and Griffith, J. E. and Qiu, Y. and Mendenhall, M. H. and Seiberling, L. E. and Tombrello, T. A. (1983) Sputtering of UF_4 by high energy heavy ions. Radiation Effects, 71 (1-2). pp. 13-33. ISSN 0033-7579. doi:10.1080/00337578308218600.

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The sputtering of UF_4 targets by energetic beams of ^(16)O, ^(19)F, and ^(35)Cl ions has been investigated for beam energies in the range 0.12 to 1.5 MeV/amu. The sputtering yields, which follow the same trend as the electronic part of the projectile energy loss in the material, are observed to have a strong dependence on the charge state of the incident ions. Data have been taken both in transmission and reflection (0° and 180° to the incident beam direction, respectively). Energy spectra of the neutral sputtered particles have been obtained for 5 MeV 19F ions and for 13 MeV ^(35)Cl ions; in both cases the spectrum has a Maxwellian form. The data obtained are compared with several models of the high energy sputtering process.

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Alternate Title:Sputtering of UF4 by high energy heavy ions
Additional Information:© 1983 Gordon and Breach Science Publishers, Inc. Received September 13, 1982. One of the authors (T.A.T.) would like to express his appreciation to Professor D. A. Bromley for the hospitality shown by the A. W. Wright uclear Structure Laboratory at Yale University where this paper was written. Supported in part by the NSF [PHY79-23638, CHE81-13273) and ASA [NAGW-202 and -148].
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Issue or Number:1-2
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Official Citation:Meins, C. K., Griffith, J. E., Qiu, Y., Mendenhall, M. H., Seiberling, L. E., & Tombrello, T. A. (1983). Sputtering of UF4 by high energy heavy ions. Radiation Effects, 71(1-2), 13-33. doi: 10.1080/00337578308218600
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:51129
Deposited On:03 Nov 2014 20:31
Last Modified:10 Nov 2021 19:06

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