A Caltech Library Service

Enhanced erosion of frozen H_2O films by high energy ^(19)F ions

Cooper, B. H. and Tombrello, T. A. (1984) Enhanced erosion of frozen H_2O films by high energy ^(19)F ions. Radiation Effects and Defects in Solids, 80 (3-4). pp. 203-221. ISSN 1042-0150. doi:10.1080/00337578408216464.

Full text is not posted in this repository. Consult Related URLs below.

Use this Persistent URL to link to this item:


We have measured sputtering yields of H_2O films with ^(19)F ions at bombarding energies from 1.6 to 25 MeV. The sputtering yield was found to be very sensitive to the incident charge state of the beam, and insensitive to the thickness of the ice film for thicknesses ranging from approximately 20 to 80×10^(16)H_2O/cm^2. The yield was independent of the target substrate temperature from 10 to 60 K and independent of the F beam current density from < 1 to approximately 5.5 particle nanoamps/mm^2. There are several models proposed to explain enhanced sputtering of dielectrics; we have discussed their relevance to our data.

Item Type:Article
Related URLs:
URLURL TypeDescription DOIArticle
Alternate Title:Enhanced erosion of frozen H2O films by high energy 19F ions
Additional Information:© 1984 Gordon and Breach Science Publishers, Inc. Received September 7, 1982. This work was supported in part by grants from NASA (NAGW-202 and -148), the NSF (PHY79-23638 and CHE81-13272), and the Caltech President's Fund.
Funding AgencyGrant Number
Caltech President's FundUNSPECIFIED
Issue or Number:3-4
Record Number:CaltechAUTHORS:20141103-094101549
Persistent URL:
Official Citation:Enhanced erosion of frozen H2O films by high energy 19f ions B. H. Cooper, T. A. Tombrello Radiation Effects Vol. 80, Iss. 3-4, 1984
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:51161
Deposited By: Tony Diaz
Deposited On:03 Nov 2014 20:44
Last Modified:10 Nov 2021 19:06

Repository Staff Only: item control page