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Surface modification using MeV ion beams

Tombrello, T. A. (1983) Surface modification using MeV ion beams. Nuclear Instruments and Methods in Physics Research, 218 (1-3). pp. 679-683. ISSN 0167-5087. doi:10.1016/0167-5087(83)91064-5.

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Electronic excitation induced by MeV/amu ion beams in a variety of materials has been employed successfully for a number of applications. The examples that will be presented are: modification of the surface reflectivities of optical material; sputter-erosion of dielectrics; and enhancement of the adhesion of thin film coatings. All of these effects arise from the loss energy by the ion beam to electrons in the target material; the mechanisms involved are at best qualitatively understood. This paper will stress not only the exploitation of such high energy bombardment techniques but will also briefly review attempts to expose the underlying causes.

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Additional Information:© 1983 Published by Elsevier B.V. The author wishes to acknowledge the use of previously unpublished data from his work with M.H. Mendenhall, Y. Qiu and J.E. Griffith. Supported in part by the NSF [CHE81-13272 and PHY79-23638], NASA [NAGW-202], the Caltech President's Fund, IBM Corp., and IRT Corp.
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NSFPHY79- 23638
Caltech President’s FundUNSPECIFIED
Issue or Number:1-3
Record Number:CaltechAUTHORS:20141103-154410873
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Official Citation:Tombrello, T. A. (1983). Surface modification using MeV ion beams. Nuclear Instruments and Methods in Physics Research, 218(1–3), 679-683. doi:
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:51205
Deposited On:04 Nov 2014 00:06
Last Modified:10 Nov 2021 19:07

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