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Sputtering of Al_2O_3 and LiNbO_3 in the electronic stopping region

Qiu, Yuanxun and Griffith, J. E. and Tombrello, T. A. (1982) Sputtering of Al_2O_3 and LiNbO_3 in the electronic stopping region. Radiation Effects and Defects in Solids, 64 (1-4). pp. 111-116. ISSN 1042-0150. http://resolver.caltech.edu/CaltechAUTHORS:20141104-125642115

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Abstract

Because of recent interest in the role played by the thermal properties of materials that exhibit high energy sputtering, we have sputtered Al_2O_3 and LiNbO_3 with chlorine ions at energies between 3 MeV and 25 MeV. To detect the sputtered Al and Nb we employ thin carbon catcher foils, which are analyzed with Rutherford scattering in the forward direction. Al surface densities of 10^(14)/cm^2 and Nb surface densities of 10^(13)/cm^2 are easily measured. The sputtering yields for both Al_2O_3 and LiNbO_3 increase rapidly with increasing chlorine energy, and the Al and Nb yields are both approximately 0.2 at 20 MeV. Tests for dose, beam current, and contamination effects will be discussed.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1080/00337578208223000 DOIArticle
http://www.tandfonline.com/doi/abs/10.1080/00337578208223000PublisherArticle
Alternate Title:Sputtering of Al2O3 and LiNbO3 in the electronic stopping region
Additional Information:© 1982 Gordon and Breach Science Publishers, Inc. Presented at the First International Conference on "Radiation Effects in Insulators", Arco, Lago di Garda, 1981. Supported in part by the National Aeronautics and Space Administration (NGR 05-002-333, NAGW-148), the National Science Foundation (PHY79-23638), and the Caltech President's Fund. Some preliminary experiments were skillfully executed by A. Anderson as part of an undergraduate summer research project. We would like to thank R. A. Weller, S. Trentalange, P. K. Half, and B. H. Cooper for their assistance and suggestions.
Funders:
Funding AgencyGrant Number
NASANGR 05-002-333
NASANAGW-148
NSFPHY79-23638
Caltech President’s FundUNSPECIFIED
Record Number:CaltechAUTHORS:20141104-125642115
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20141104-125642115
Official Citation:Sputtering of Al2O3 and LiNbO3 in the electronic stopping region Yuanxun Qiu, J. E. Griffith, T. A. Tombrello Radiation Effects Vol. 64, Iss. 1-4, 1982
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:51238
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:04 Nov 2014 21:34
Last Modified:04 Nov 2014 21:34

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