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W/SiC x-ray multilayers optimized for use above 100 keV

Windt, David L. and Donguy, Soizik and Hailey, Charles J. and Koglin, Jason and Honkimaki, Veijo and Ziegler, Eric and Christensen, Finn E. and Chen, Hubert and Harrison, Fiona A. and Craig, William W. (2003) W/SiC x-ray multilayers optimized for use above 100 keV. Applied Optics, 42 (13). pp. 2415-2421. ISSN 0003-6935.

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We have developed a new depth-graded multilayer system comprising W and SiC layers, suitable for use as hard x-ray reflective coatings operating in the energy range 100-200 keV. Grazing-incidence x-ray reflectance at E = 8 keV was used to characterize the interface widths, as well as the temporal and thermal stability in both periodic and depth-graded W/SiC structures, whereas synchrotron radiation was used to measure the hard x-ray reflectance of a depth-graded multilayer designed specifically for use in the range E ~150-170 keV. We have modeled the hard x-ray reflectance using newly derived optical constants, which we determined from reflectance versus incidence angle measurements also made using synchrotron radiation, in the range E = 120-180 keV. We describe our experimental investigation in detail, compare the new W/SiC multilayers with both W/Si and W/B4C films that have been studied previously, and discuss the significance of these results with regard to the eventual development of a hard x-ray nuclear line telescope.

Item Type:Article
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URLURL TypeDescription
Christensen, Finn E.0000-0001-5679-1946
Harrison, Fiona A.0000-0003-2992-8024
Additional Information:© 2003 Optical Society of America. Received 11 August 2002; revised manuscript received 29 October 2002. This research was funded by a Supporting Research and Technology grant from NASA.
Group:Space Radiation Laboratory
Funding AgencyGrant Number
Subject Keywords:multilayers; thin films; x-ray mirrors; astronomical optics
Issue or Number:13
Record Number:CaltechAUTHORS:WINao03
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Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:5279
Deposited By: Lindsay Cleary
Deposited On:09 Oct 2006
Last Modified:09 Mar 2020 13:18

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