Mead, Carver A. (1971) Current Flow through Thin Insulating Films: Basic Principles and Device Applications. Journal of Vacuum Science and Technology, 8 (1). p. 98. ISSN 0022-5355. doi:10.1116/1.1316370. https://resolver.caltech.edu/CaltechAUTHORS:20141215-165521589
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Abstract
The fundamental physics underlying current flow through thin insulating films is reviewed, with emphasis placed on those experiments central to the identification of the dominant current flow mechanism in a given structure. Recent data obtained on metal-insulator-metal structures incorporating single crystal thin films represents unambiguous observation of both thermionic emission and tunneling. Device applications of thin films are also summarized.
| Item Type: | Article | |||||||||
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| Additional Information: | © 1971 American Vacuum Society. | |||||||||
| Issue or Number: | 1 | |||||||||
| DOI: | 10.1116/1.1316370 | |||||||||
| Record Number: | CaltechAUTHORS:20141215-165521589 | |||||||||
| Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:20141215-165521589 | |||||||||
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | |||||||||
| ID Code: | 52839 | |||||||||
| Collection: | CaltechAUTHORS | |||||||||
| Deposited By: | INVALID USER | |||||||||
| Deposited On: | 16 Dec 2014 17:37 | |||||||||
| Last Modified: | 10 Nov 2021 19:44 |
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