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Current Flow through Thin Insulating Films: Basic Principles and Device Applications

Mead, Carver A. (1971) Current Flow through Thin Insulating Films: Basic Principles and Device Applications. Journal of Vacuum Science and Technology, 8 (1). p. 98. ISSN 0022-5355. doi:10.1116/1.1316370. https://resolver.caltech.edu/CaltechAUTHORS:20141215-165521589

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Abstract

The fundamental physics underlying current flow through thin insulating films is reviewed, with emphasis placed on those experiments central to the identification of the dominant current flow mechanism in a given structure. Recent data obtained on metal-insulator-metal structures incorporating single crystal thin films represents unambiguous observation of both thermionic emission and tunneling. Device applications of thin films are also summarized.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1116/1.1316370DOIArticle
http://scitation.aip.org/content/avs/journal/jvst/8/1/10.1116/1.1316370PublisherArticle
Additional Information:© 1971 American Vacuum Society.
Issue or Number:1
DOI:10.1116/1.1316370
Record Number:CaltechAUTHORS:20141215-165521589
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20141215-165521589
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:52839
Collection:CaltechAUTHORS
Deposited By: Kristin Buxton
Deposited On:16 Dec 2014 17:37
Last Modified:10 Nov 2021 19:44

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