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Boundary Layer Profiles in Plasma Chemical Vapor Deposition

Green, David S. and Owano, Thomas G. and Williams, Skip and Goodwin, David G. and Zare, Richard N. and Kruger, Charles H. (1993) Boundary Layer Profiles in Plasma Chemical Vapor Deposition. Science, 259 (5102). pp. 1726-1729. ISSN 0036-8075. http://resolver.caltech.edu/CaltechAUTHORS:20150109-114647059

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Abstract

A nonlinear optical spectroscopy based on degenerate four-wave mixing has made possible direct measurements of species temperature and concentration profiles through the boundary layer of a reactive plasma at atmospheric pressure. Spectra were obtained for CH and C_2 radicals over a range of conditions including those for the plasma chemical vapor deposition of diamond films. Numerical simulations based on a one-dimensional stagnation-point flow model are in good agreement with the measurements. The CH mole fraction is shown to rise and fall as a function of distance from the substrate, which is compelling experimental evidence for the complex chemistry that is occurring in the plasma boundary layer.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1126/science.259.5102.1726DOIArticle
http://www.sciencemag.org/content/259/5102/1726PublisherArticle
http://www.jstor.org/stable/2881209JSTORArticle
ORCID:
AuthorORCID
Zare, Richard N.0000-0001-5266-4253
Additional Information:© 1993 American Association for the Advancement of Science. 26 October 1992; Accepted 23 December 1992. D.S.G. is a Natural Science and Engineering Research Council (Canada) postdoctoral fellow. S.W. is an Air Force Office of Scientific Research graduate scholar. This work was supported by several sources: C.H.K. acknowledges support from the Department of Energy under contract DE-FG03-88ER13957 and R.N.Z. from the Department of Energy under contract DE-FG03-92ER14304.
Funders:
Funding AgencyGrant Number
Department of Energy (DOE)DE-FG03-88ER13957
Department of Energy (DOE)DE-FG03-92ER14304
Record Number:CaltechAUTHORS:20150109-114647059
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20150109-114647059
Official Citation:Green, D. S., Owano, T. G., Williams, S., Goodwin, D. G., Zare, R. N., & Kruger, C. H. (1993). Boundary Layer Profiles in Plasma Chemical Vapor Deposition. Science, 259(5102), 1726-1729. doi: 10.1126/science.259.5102.1726
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:53481
Collection:CaltechAUTHORS
Deposited By: Joanne McCole
Deposited On:09 Jan 2015 20:47
Last Modified:13 Apr 2017 23:58

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