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Photoinduced, polyelectrolyte-driven release of contents of phosphatidylcholine bilayer vesicles

You, Hong and Tirrell, David A. (1991) Photoinduced, polyelectrolyte-driven release of contents of phosphatidylcholine bilayer vesicles. Journal of the American Chemical Society, 113 (10). pp. 4022-4023. ISSN 0002-7863. https://resolver.caltech.edu/CaltechAUTHORS:YOUjacs1991

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Abstract

We report herein a new approach to the photoinduced release of contents of lipid bilayer vesicles. The method builds on prior work from this laboratory, in which it was shown that adsorption of the hydrophobic polyelectrolyte poly(2-ethylacrylic acid) (PEAA, 1) on phosphatidylcholine (PC, 2) membranes causes conversion of the lipid from vesicular to mixed micellar form. The adsorption of PEAA and the attendant vesicle-to-micelle transition are driven by increasing proton concentration, such that PC vesicles that are resistant to leakage at pH 7.4 can be induced to release their contents rapidly and quantitatively upon mild acidification. In the work described herein, we have used 3,3’-dicarboxydiphenyliodonium salts (3) as water-soluble, photosensitive proton sources. Irradiation of vesicular PC suspensions prepared in dilute aqueous solutions of 1 and 3 results in rapid loss of vesicle contents.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1021/ja00010a071DOIArticle
http://pubs.acs.org/doi/abs/10.1021/ja00010a071PublisherArticle
ORCID:
AuthorORCID
Tirrell, David A.0000-0003-3175-4596
Additional Information:© 1991 American Chemical Society. Received January 18, 1991; Revised Manuscript Received March 18, 1991. This work was supported by US. Army Research Office Grant DAAL03-88-K-0038.
Funders:
Funding AgencyGrant Number
Army Research Office (ARO)DAAL03-88-K-0038
Issue or Number:10
Record Number:CaltechAUTHORS:YOUjacs1991
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:YOUjacs1991
Official Citation:Photoinduced, polyelectrolyte-driven release of contents of phosphatidylcholine bilayer vesicles Hong You and David A. Tirrell Journal of the American Chemical Society 1991 113 (10), 4022-4023
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:53514
Collection:CaltechAUTHORS
Deposited By: Anne Hormann
Deposited On:22 Jan 2015 22:47
Last Modified:03 Oct 2019 07:50

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