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Ordered Silicon Microwire Arrays Grown from Substrates Patterned Using Imprint Lithography and Electrodeposition

Audesirk, Heather A. and Warren, Emily L. and Ku, Jessie and Lewis, Nathan S. (2015) Ordered Silicon Microwire Arrays Grown from Substrates Patterned Using Imprint Lithography and Electrodeposition. ACS Applied Materials & Interfaces, 7 (3). pp. 1396-1400. ISSN 1944-8244. http://resolver.caltech.edu/CaltechAUTHORS:20150120-082307878

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Abstract

Silicon microwires grown by the vapor–liquid–solid process have attracted a great deal of interest as potential light absorbers for solar energy conversion. However, the research-scale techniques that have been demonstrated to produce ordered arrays of micro and nanowires may not be optimal for use as high-throughput processes needed for large-scale manufacturing. Herein we demonstrate the use of microimprint lithography to fabricate patterned templates for the confinement of an electrodeposited Cu catalyst for the vapor–liquid–solid (VLS) growth of Si microwires. A reusable polydimethylsiloxane stamp was used to pattern holes in silica sol–gels on silicon substrates, and the Cu catalyst was electrodeposited into the holes. Ordered arrays of crystalline p-type Si microwires were grown across the sol–gel-patterned substrates with materials quality and performance comparable to microwires fabricated with high-purity metal catalysts and cleanroom processing.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1021/am507200jDOIArticle
http://pubs.acs.org/doi/abs/10.1021/am507200jPublisherArticle
http://pubs.acs.org/doi/suppl/10.1021/am507200jPublisherSupporting Information
ORCID:
AuthorORCID
Warren, Emily L.0000-0001-8568-7881
Lewis, Nathan S.0000-0001-5245-0538
Additional Information:© 2015 American Chemical Society. Received: October 17, 2014; Accepted: January 6, 2015; Publication Date (Web): January 6, 2015. This work was supported by the National Science Foundation (Grant NSF-1214152), BP, the Gordon and Betty Moore Foundation, and DARPA. H.A.A. also acknowledges partial support from Dow Chemical. This work was partially performed at the Kavli Nanoscience Institute at the California Institute of Technology.
Group:Kavli Nanoscience Institute
Funders:
Funding AgencyGrant Number
NSFNSF-1214152
BPUNSPECIFIED
Gordon and Betty Moore FoundationUNSPECIFIED
Defense Advanced Research Projects Agency (DARPA)UNSPECIFIED
Dow ChemicalUNSPECIFIED
Record Number:CaltechAUTHORS:20150120-082307878
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20150120-082307878
Official Citation:Ordered Silicon Microwire Arrays Grown from Substrates Patterned Using Imprint Lithography and Electrodeposition Heather A. Audesirk, Emily L. Warren, Jessie Ku, and Nathan S. Lewis ACS Applied Materials & Interfaces 2015 7 (3), 1396-1400 DOI: 10.1021/am507200j
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:53854
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:20 Jan 2015 16:33
Last Modified:31 Jan 2017 20:25

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