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Ultraviolet surface plasmon-mediated low temperature hydrazine decomposition

Peng, Siying and Sheldon, Matthew T. and Liu, Wei-Guang and Jaramillo-Botero, Andres and Goddard, William Andrew, III and Atwater, Harry A. (2015) Ultraviolet surface plasmon-mediated low temperature hydrazine decomposition. Applied Physics Letters, 106 (2). Art. No. 023102. ISSN 0003-6951. doi:10.1063/1.4905593.

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Conventional methods require elevated temperatures in order to dissociate high-energy nitrogen bonds in precursor molecules such as ammonia or hydrazine used for nitride film growth. We report enhanced photodissociation of surface-absorbed hydrazine (N_2H_4) molecules at low temperature by using ultraviolet surface plasmons to concentrate the exciting radiation. Plasmonic nanostructured aluminum substrates were designed to provide resonant near field concentration at λ = 248 nm (5 eV), corresponding to the maximum optical cross section for hydrogen abstraction from N_2H_4. We employed nanoimprint lithography to fabricate 1 mm × 1 mm arrays of the resonant plasmonic structures, and ultraviolet reflectance spectroscopy confirmed resonant extinction at 248 nm. Hydrazine was cryogenically adsorbed to the plasmonic substrate in a low-pressure ambient, and 5 eV surface plasmons were resonantly excited using a pulsed KrF laser. Mass spectrometry was used to characterize the photodissociation products and indicated a 6.2× overall enhancement in photodissociation yield for hydrazine adsorbed on plasmonic substrates compared with control substrates. The ultraviolet surface plasmon enhanced photodissociation demonstrated here may provide a valuable method to generate reactive precursors for deposition of nitride thin film materials at low temperatures.

Item Type:Article
Related URLs:
URLURL TypeDescription
Peng, Siying0000-0002-1541-0278
Sheldon, Matthew T.0000-0002-4940-7966
Liu, Wei-Guang0000-0002-6633-7795
Jaramillo-Botero, Andres0000-0003-2844-0756
Goddard, William Andrew, III0000-0003-0097-5716
Atwater, Harry A.0000-0001-9435-0201
Additional Information:© 2015 AIP Publishing LLC. Received 27 August 2014; accepted 26 December 2014; published online 12 January 2015. This work was supported by DARPA under Grant No. W911NF-13-1-0040 and utilized facilities of the Kavli Nanoscience Institute at Caltech.
Group:Kavli Nanoscience Institute
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Army Research Office (ARO)W911NF-13-1-0040
Defense Advanced Research Projects Agency (DARPA)UNSPECIFIED
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Issue or Number:2
Record Number:CaltechAUTHORS:20150120-114536870
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Official Citation:Ultraviolet surface plasmon-mediated low temperature hydrazine decomposition Siying Peng (彭斯颖 ), Matthew T. Sheldon, Wei-Guang Liu, Andres Jaramillo-Botero, William Andrew Goddard III and Harry A. Atwater Appl. Phys. Lett. 106, 023102 (2015);
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:53878
Deposited By: Ruth Sustaita
Deposited On:20 Jan 2015 22:12
Last Modified:10 Nov 2021 20:08

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