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Schottky Barrier Gate Field Effect Transistor

Mead, C. A. (1966) Schottky Barrier Gate Field Effect Transistor. Proceedings of the IEEE, 54 (2). pp. 307-308. ISSN 0018-9219. doi:10.1109/PROC.1966.4661. https://resolver.caltech.edu/CaltechAUTHORS:20150123-165629708

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Abstract

An obvious addition to the ever-growing family of field-effect devices is a field-effect transistor with a Schottky barrier gate. It is the purpose of this correspondence 1) to demonstrate that indeed such a device does function as expected and 2) to point out several advantages of such a structure under certain circumstances. A schematic cross section of the device is shown in Fig. 1. The gate consists of a metal in intimate contact with the clean semiconductor surface. Clearly the ohmic contacts can be placed either on top of or under the semiconductor layer.


Item Type:Article
Related URLs:
URLURL TypeDescription
https://doi.org/10.1109/PROC.1966.4661DOIArticle
Additional Information:© 1966 IEEE. Manuscript received December 15, 1965. This work was supported in part by the Office of Naval Research, Washington, D.C. The author wishes to thank L. Bailey and E. Mehal for supplying the GaAs material used in these experiments.
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Funding AgencyGrant Number
Office of Naval Research (ONR)UNSPECIFIED
Issue or Number:2
DOI:10.1109/PROC.1966.4661
Record Number:CaltechAUTHORS:20150123-165629708
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20150123-165629708
Official Citation:C. A. Mead, "Schottky barrier gate field effect transistor," in Proceedings of the IEEE, vol. 54, no. 2, pp. 307-308, Feb. 1966, doi: 10.1109/PROC.1966.4661
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:54042
Collection:CaltechAUTHORS
Deposited By:INVALID USER
Deposited On:26 Jan 2015 16:07
Last Modified:25 Apr 2022 22:07

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