Moon, D. W. and Vreeland, T., Jr. (1969) The initiation of yielding in silicon-iron. Acta Metallurgica, 17 (8). pp. 989-996. ISSN 0001-6160. doi:10.1016/0001-6160(69)90043-1. https://resolver.caltech.edu/CaltechAUTHORS:20150218-153827768
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Abstract
An experimental program was conducted in which the etch pit technique was used for the direct observation of dislocation configurations at various stages of yielding. Poly-crystalline tensile specimens of 3 per cent silicon-iron were loaded in tension at constant strain rate and by load pulses. A new model of the delay-time for yielding at constant applied stress is presented. Three assumptions used are (a) no dislocation motion occurs below a critical resolved shear stress, (b) the yielding rate is dependent upon the velocity of mobile dislocations, and (c) the end of the delay period occurs when yielding of the grains has spread continuously through the thickness of the specimen. This model is consistent with the experimental observations and explains the true static upper yield point and the shape of the strain vs. time curve at constant applied stress. The model also yields reasonable values for the stress concentration factor on grains in the critical cross-section that are least favorably oriented for slip.
Item Type: | Article | |||||||||
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Alternate Title: | Comportement au passage de la limite elastique dans le fer-silicium, Das einsetzen des flieβens in silizium-eisen | |||||||||
Additional Information: | © 1969 Published by Elsevier Ltd. Received August 17, 1968: revised November 25, 1968. The experimental portion of this work was supported by the U.S. AEC under Contract No. AT(04-3)-473. CALT 473-30. | |||||||||
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Issue or Number: | 8 | |||||||||
DOI: | 10.1016/0001-6160(69)90043-1 | |||||||||
Record Number: | CaltechAUTHORS:20150218-153827768 | |||||||||
Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:20150218-153827768 | |||||||||
Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | |||||||||
ID Code: | 54960 | |||||||||
Collection: | CaltechAUTHORS | |||||||||
Deposited By: | Tony Diaz | |||||||||
Deposited On: | 20 Feb 2015 04:48 | |||||||||
Last Modified: | 10 Nov 2021 20:39 |
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