CaltechAUTHORS
  A Caltech Library Service

Comments on the Measurement of Dislocation Mobility and the Drag Due to Phonons and Electrons

Vreeland, T., Jr. and Jassby, K. M. (1972) Comments on the Measurement of Dislocation Mobility and the Drag Due to Phonons and Electrons. , Pasadena, CA. (Unpublished) http://resolver.caltech.edu/CaltechAUTHORS:20150311-140304313

[img] PDF - Submitted Version
See Usage Policy.

4Mb

Use this Persistent URL to link to this item: http://resolver.caltech.edu/CaltechAUTHORS:20150311-140304313

Abstract

Experimental methods for the measurement of intrinsic interactions between moving dislocations and the crystal lattice are considered. It is emphasized that the stress pulse method is applicable at stress levels greater than about twice the static flow stress, while internal friction experiments may be used to explore the interaction at very low stress levels and small dislocation velocities. Recent results of low temperature stress pulse measurements in Cu are presented. The interactions deduced from measurements between 4.2°K and 400°K in some FCC metals are compared to theoretical predictions. Suggestions are made for future theoretical and experimental work on unresolved aspects of the intrinsic interactions.


Item Type:Report or Paper (Discussion Paper)
Additional Information:This work was supported by the U.S. Atomic Energy Commission. CALT 767-P3-29.
Funders:
Funding AgencyGrant Number
Atomic Energy CommissionUNSPECIFIED
Other Numbering System:
Other Numbering System NameOther Numbering System ID
CALT767-P3-29
Record Number:CaltechAUTHORS:20150311-140304313
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20150311-140304313
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:55710
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:11 Mar 2015 21:10
Last Modified:11 Mar 2015 21:10

Repository Staff Only: item control page