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Dislocation Interactions with Thermal Phonons and Conduction Electrons

Vreeland, T., Jr. and Jassby, K. M. (1972) Dislocation Interactions with Thermal Phonons and Conduction Electrons. , Pasadena, CA. (Unpublished) http://resolver.caltech.edu/CaltechAUTHORS:20150311-150317669

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Abstract

Experimental methods for the measurement of intrinsic interactions between moving dislocations and the crystal lattice are considered. It is emphasized that the stress pulse method is applicable at stress levels greater than about twice the static flow stress, while internal friction experiments may be used to explore the interaction at very low stress levels and small dislocation velocities. Recent results of low temperature stress pulse measurements in Cu are presented. The interactions deduced from measurements between 4.2°K and 400°K in some FCC metals are compared to theoretical predictions. Suggestions are made for future theoretical and experimental work on unresolved aspects of the intrinsic interactions.


Item Type:Report or Paper (Technical Report)
Additional Information:This work was supported by the U.S. Atomic Energy Commission.
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Funding AgencyGrant Number
Atomic Energy CommissionUNSPECIFIED
Record Number:CaltechAUTHORS:20150311-150317669
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20150311-150317669
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:55715
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:11 Mar 2015 22:48
Last Modified:11 Mar 2015 22:48

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