Photolithographic olefin metathesis polymerization

Abstract

Current methods of lithog. patterning materials rely on acid- and radical-catalyzed reactions, which are incompatible with many desirable functionalities. As a result, templating steps are required to pattern the materials of interest, through geometric inversion or surface coating. By the end of the process, the photoresist is typically discarded in its entirety, and many extra steps, each with their own compatibility concerns, are required to achieve the desired patterned functionality. We aim to replace these cumbersome steps with a straightforward approach to the fabrication of functional materials, interfaces and nanostructures. We have developed a lithog. technique using a ruthenium photocatalyst, termed <u>P</u>hoto<u>L< /u>ithog. <u>O</u>lefin <u>M</u>etathesis <u>P</u>olymerization (PLOMP), which is able to directly photopattern a wide variety of functional materials on the micro- and nanoscale. In this procedure, a latent metathesis catalyst is activated by UV light to react with the olefins in the surrounding environment. We have devised a recipe that incorporates all of the reagents into the PLOMP photoresist, enabling the waste-free synthesis of a versatile patterning platform in a quick one-pot reaction. A vast array of functional groups can be incorporated into PLOMP photoresists, and used for a no. of lithog. applications.