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Comparison of Pulsed and Continuous-Wave Deposition of Thin Films from Saturated Fluorocarbon/H_2 Inductively Coupled rf Plasmas

Mackie, Neil M. and Dalleska, N. F. and Castner, David G. and Fisher, Ellen R. (1997) Comparison of Pulsed and Continuous-Wave Deposition of Thin Films from Saturated Fluorocarbon/H_2 Inductively Coupled rf Plasmas. Chemistry of Materials, 9 (1). pp. 349-362. ISSN 0897-4756. http://resolver.caltech.edu/CaltechAUTHORS:20150622-144457058

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Abstract

Thin films are prepared by plasma polymerization using inductively coupled continuous-wave (CW) and variable duty cycle pulsed rf plasmas. The effects of hydrogen addition (0−97.5%) on thin films deposited from CW saturated fluorocarbon (CF_4 and C_2F_6) plasmas are examined. Variable duty cycle, pulsed C_2F_6 rf plasmas are employed for comparison to the CW results. Film properties are determined using Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), and scanning electron microscopy (SEM). Deposition rates and contact angles are also measured for all films. Analysis using these techniques indicates a strong dependence of the bulk and surface structure on the hydrogen content of the feed in the CW systems. Significantly different film chemistry and deposition rates are observed in the pulsed systems. For the pulsed systems, film composition is dependent on duty cycle and relative pulse on and off times. Using an optimum duty cycle of 3% results in a less cross-linked fluorocarbon polymer, with primarily CF_2 species in the bulk film and CF_3 surface termination.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1021/cm960388qDOIArticle
http://pubs.acs.org/doi/abs/10.1021/cm960388qPublisherArticle
ORCID:
AuthorORCID
Dalleska, N. F.0000-0002-2059-1587
Alternate Title:Comparison of Pulsed and Continuous-Wave Deposition of Thin Films from Saturated Fluorocarbon/H2 Inductively Coupled rf Plasmas
Additional Information:© 1997 American Chemical Society. Received July 19, 1996. Revised Manuscript Received October 2, 1996. Acknowledgment is made to the donors of The Petroleum Research Fund, administered by the ACS (E.R.F.) and to NIH Grant RR01296 (D.G.C.) for support of this research. E.R.F. also acknowledges support from Colorado State University through the Faculty Diversity Career Enhancement Fund and Faculty Research Grants.
Funders:
Funding AgencyGrant Number
American Chemical Society Petroleum Research FundUNSPECIFIED
NIHRR01296
Colorado State UniversityUNSPECIFIED
Record Number:CaltechAUTHORS:20150622-144457058
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20150622-144457058
Official Citation:Comparison of Pulsed and Continuous-Wave Deposition of Thin Films from Saturated Fluorocarbon/H2 Inductively Coupled rf Plasmas Neil M. Mackie, N. F. Dalleska, David G. Castner, and Ellen R. Fisher Chemistry of Materials 1997 9 (1), 349-362 DOI: 10.1021/cm960388q
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:58417
Collection:CaltechAUTHORS
Deposited By: George Porter
Deposited On:22 Jun 2015 23:00
Last Modified:11 Apr 2017 16:24

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