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Plasma enhanced chemical vapor deposition of SiO_2 using novel alkoxysilane precursors

Bogart, K. H. A. and Dalleska, N. F. and Bogart, G. R. and Fisher, Ellen R. (1995) Plasma enhanced chemical vapor deposition of SiO_2 using novel alkoxysilane precursors. Journal of Vacuum Science and Technology A, 13 (2). pp. 476-480. ISSN 0734-2101. http://resolver.caltech.edu/CaltechAUTHORS:20150622-144457314

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Abstract

This communication describes our results using these novel alkoxysilane precursors for PECVD of SiO_2 films in an inductively coupled rf plasma reactor. The effects of deposition time, rf power, and organosilane pressure on the films’ characteristics are described.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1116/1.579382DOIArticle
http://scitation.aip.org/content/avs/journal/jvsta/13/2/10.1116/1.579382PublisherArticle
ORCID:
AuthorORCID
Dalleska, N. F.0000-0002-2059-1587
Alternate Title:Plasma enhanced chemical vapor deposition of SiO2 using novel alkoxysilane precursors
Additional Information:© 1995 American Vacuum Society. (Received 10 November 1994; accepted 10 December 1994) The support of the National Science Foundation under Grant No. DMR-9409272, Sandia National Laboratories under Contract No. AJ-3848 and Colorado State University through the Faculty Diversity Career Enhancement Fund and Faculty Research Grants is gratefully acknowledged.
Funders:
Funding AgencyGrant Number
NSFDMR-9409272
Sandia National LaboratoriesAJ-3848
Colorado State UniversityUNSPECIFIED
Record Number:CaltechAUTHORS:20150622-144457314
Persistent URL:http://resolver.caltech.edu/CaltechAUTHORS:20150622-144457314
Official Citation:Plasma enhanced chemical vapor deposition of SiO2 using novel alkoxysilane precursors Bogart, K. H. A. and Dalleska, N. F. and Bogart, G. R. and Fisher, Ellen R., Journal of Vacuum Science & Technology A, 13, 476-480 (1995), DOI:http://dx.doi.org/10.1116/1.579382
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:58418
Collection:CaltechAUTHORS
Deposited By: George Porter
Deposited On:22 Jun 2015 22:52
Last Modified:11 Apr 2017 16:24

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