Livanos, A. C. and Katzir, A. and Shellan, J. B. and Yariv, A. (1977) Linearity and enhanced sensitivity of the Shipley AZ-1350B photoresist. Applied Optics, 16 (6). pp. 1633-1635. ISSN 0003-6935. https://resolver.caltech.edu/CaltechAUTHORS:LIVao77
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Abstract
The properties of the Shipley AZ-1350B positive photoresist used with the Shipley AZ-303A developer were investigated. It was found that the use of AZ-303A developer results in a significant improvement of the sensitivity and the linearity of the photoresist. The unexposed etch rate of the photoresist was 35 Å ± 5 Å/sec. Gratings of high efficiency have been successfully fabricated using the above combination of photoresist and developer.
| Item Type: | Article | ||||||
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| Additional Information: | © Copyright 1977 Optical Society of America Received 27 November 1976. The authors thank D. R. Armstrong for his valuable technical assistance. This research was supported by the U.S. Air Force Office of Scientific Research. The work of J. B. Shellan is supported in part by the Hertz Foundation. | ||||||
| Issue or Number: | 6 | ||||||
| Record Number: | CaltechAUTHORS:LIVao77 | ||||||
| Persistent URL: | https://resolver.caltech.edu/CaltechAUTHORS:LIVao77 | ||||||
| Usage Policy: | No commercial reproduction, distribution, display or performance rights in this work are provided. | ||||||
| ID Code: | 5910 | ||||||
| Collection: | CaltechAUTHORS | ||||||
| Deposited By: | Archive Administrator | ||||||
| Deposited On: | 08 Nov 2006 | ||||||
| Last Modified: | 02 Oct 2019 23:27 |
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