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Fabrication of high-density nanostructures by electron beam lithography

Dial, O. and Cheng, C. C. and Scherer, A. (1998) Fabrication of high-density nanostructures by electron beam lithography. Journal of Vacuum Science and Technology B, 16 (6). pp. 3887-3890. ISSN 1071-1023. doi:10.1116/1.590428.

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We demonstrate a fabrication method to define high-density, uniform nanostructures by electron beam lithography at conventional beam voltages (< 40 kV). Here we optimize the exposure and development conditions needed to generate such nanostructure arrays using polymethylmethacrylate as positive resist and isopropyl alcohol as a developer. Arrays of 12 nm dots with 25 nm period and 20 nm lines with 40 nm period were fabricated to show the resolution of this optimized process.

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Additional Information:©1998 American Vacuum Society. (Received 29 May 1998; accepted 29 September 1998) This work was supported by the Army Research Office and the National Science Foundation, which are gratefully acknowledged.
Subject Keywords:electron beam lithography; nanotechnology
Issue or Number:6
Record Number:CaltechAUTHORS:DIAjvstb98
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Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:5964
Deposited By: Archive Administrator
Deposited On:09 Nov 2006
Last Modified:08 Nov 2021 20:30

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