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Holey Graphene as a Weed Barrier for Molecules

Gethers, Matthew L. and Thomas, John C. and Jiang, Shan and Weiss, Nathan O. and Duan, Xiangfang and Goddard, William A. and Weiss, Paul S. (2015) Holey Graphene as a Weed Barrier for Molecules. ACS Nano, 9 (11). pp. 10909-10915. ISSN 1936-0851. doi:10.1021/acsnano.5b03936. https://resolver.caltech.edu/CaltechAUTHORS:20151012-132204304

[img] PDF (Transmission electron microscope images that show hole diameter analysis, freshly deposited “holey” graphene on Au{111} before and after heating, STM images used to compute nearest neighbor spacings, and thresholding analyses used to segment molecular...) - Supplemental Material
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Abstract

We demonstrate the use of “holey” graphene as a mask against molecular adsorption. Prepared porous graphene is transferred onto a Au{111} substrate, annealed, and then exposed to dilute solutions of 1-adamantanethiol. In the pores of the graphene lattice, we find islands of organized, self-assembled molecules. The bare Au in the pores can be regenerated by postdeposition annealing, and new molecules can be self-assembled in the exposed Au region. Graphene can serve as a robust, patternable mask against the deposition of self-assembled monolayers.


Item Type:Article
Related URLs:
URLURL TypeDescription
http://dx.doi.org/10.1021/acsnano.5b03936DOIArticle
http://pubsdc3.acs.org/doi/10.1021/acsnano.5b03936PublisherArticle
http://pubsdc3.acs.org/doi/suppl/10.1021/acsnano.5b03936PublisherSupporting Information
ORCID:
AuthorORCID
Goddard, William A.0000-0003-0097-5716
Additional Information:© 2015 American Chemical Society. Received for review June 27, 2015, and accepted October 1, 2015. Publication Date (Web): October 1, 2015. We thank the Department of Energy Grant #DE-SC-0005025 for support of the instrumentation and methods developed and applied here. Partial support was provided by NSF Grant #ODISSEI-EFRI-1332411 and the Caltech EAS Discovery Fund (M.G. and W.A.G.). We also thank the NSF (Grant #EFRI-1433541) for support (X.F.D., S.J., and N.O.W.). J.C.T. acknowledges support from an excellence in chemistry graduate research fellowship from UCLA. P.S.W. acknowledges support from the Caltech Kavli Nanoscience Institute and Joint Center for Artificial Photosynthesis. We gratefully thank Jeffrey J. Schwartz, Ivo Atanasov, and Chih-Yen Chen for helpful discussions. The authors declare no competing financial interest.
Group:Kavli Nanoscience Institute, JCAP
Funders:
Funding AgencyGrant Number
Department of Energy (DOE)DE-SC-0005025
NSFODISSEI-EFRI-1332411
Caltech EAS Discovery FundUNSPECIFIED
NSFEFRI-1433541
UCLAUNSPECIFIED
Kavli Nanoscience InstituteUNSPECIFIED
Joint Center for Artificial Photosynthesis (JCAP)UNSPECIFIED
Subject Keywords:nanoscience; graphene; mask; chemical patterning; self-assembly; scanning tunneling microscopy
Other Numbering System:
Other Numbering System NameOther Numbering System ID
WAG1147
Issue or Number:11
DOI:10.1021/acsnano.5b03936
Record Number:CaltechAUTHORS:20151012-132204304
Persistent URL:https://resolver.caltech.edu/CaltechAUTHORS:20151012-132204304
Official Citation:Holey Graphene as a Weed Barrier for Molecules Matthew L. Gethers, John C. Thomas, Shan Jiang, Nathan O. Weiss, Xiangfang Duan, William A. Goddard, III, and Paul S. Weiss ACS Nano 2015 9 (11), 10909-10915 DOI: 10.1021/acsnano.5b03936
Usage Policy:No commercial reproduction, distribution, display or performance rights in this work are provided.
ID Code:60981
Collection:CaltechAUTHORS
Deposited By: Tony Diaz
Deposited On:15 Oct 2015 21:42
Last Modified:10 Nov 2021 22:42

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